Showing all 3 results

General PVD

Show 9 12 18 24

General PVD System SA-eVictor AX20P

, ,

In stock

SKU: SA-eVictor AX20P
Wafer Size6″, 8″
THK mean(A)1000±50(Ni), 600±30(Ti), 1000±50(TiN), 40K±2K(Al)
Rs Mean(Ω/□)1±0.02(Ni), 11±1.0(Ti), 16±3.0(TiN), 0.75±0.05(Al)
Rs U%(WIW,%,16)< 3%
Infilm Particle< 30ea@0.3μm
Size(L×W×H)2700mm×3200mm×2200mm, 4400mm×3100mm×2200mm

General PVD System SA-Polaris BM620

, ,

In stock

SKU: SA-Polaris BM620
Wafer Size6″, 8″
THK mean(A)1500±75(Ni), 2000±100(Ti), 10K±500(Ag)
Rs Mean(Ω/□)0.6±0.1(Ni), 2.9±0.3(Ti), 0.021±0.005(Ag)
Rs U%(WIW,%,16)< 3@EE3
Infilm Particle< 30ea@0.3μm
Size(L×W×H)2700mm×3200mm×2200mm, 4400mm×3100mm×2200mm
Hot

Multi-chamber Intergated System SA-VKC600

, ,

In stock

SKU: SA-VKC600
Process Chamber TypeSputter & Degas & Pre-clean & Evaporation
Autosampling ChamberIntegrated with BROOKS system
Ion Sourceoptional
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow ControlDigital mass flow meter
Coating Uniformity±2%
Coating Repeatability±2%
Uniform Deposition Area(max.)Ø200 mm
Ultimate Vacuum1E-5Pa
Vacuum MeasurementFull-range vacuum gauge + ‌Capacitance diaphragm gauge
Temperature Range-80~500℃
Size(L×W×H)3.73m×2.75m×2.2m