Showing all 5 results
Chain Magnetron Sputter System SA-VKI2000
In stock
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SKU:
SA-VKI2000
| Number of Cathodes(max.) | 2 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Ion Source | Anode & Kaufman & RF ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | ±3% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | 1000 mm×1000 mm |
| Ultimate Vacuum | 3E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + Capacitance diaphragm gauge |
| Temperature Range | RT~300℃ |
| Size(L×W×H) | 5m×2.8m×1.6m |
Magnetron Sputter System SA-VKM360
In stock
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SKU:
SA-VKM360
| Number of Cathodes(max.) | 4 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Ion Source | RF & Kaufman & Hall ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | ±3% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø150 mm |
| Vacuum Measurement | Full-range vacuum gauge + Capacitance diaphragm gauge |
| Ultimate Vacuum | 1E-5Pa |
| Temperature Range | RT~300℃ |
| Size(L×W×H) | 1.6m×2.75m×1.8m |
Magnetron Sputter System SA-VKM600/M700
In stock
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SKU:
SA-VKM600/M700
| Number of Cathodes(max.) | 5 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Single-wafer / multi-wafer fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø300 mm |
| Ultimate Vacuum | 8E-6Pa |
| Vacuum Measurement | Full-range vacuum gauge + Capacitance diaphragm gauge |
| Temperature Range | -50~800℃ |
| Size(L×W×H) | 3.2m×3.3m×2.2m |
Magnetron Sputter System SA-VKM800
In stock
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SKU:
SA-VKM800
| Number of Cathodes(max.) | 4 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Ion Source | RF & Kaufman & Hall ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Multi-wafer fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | ±1.5% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | 5×Ø300 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + Capacitance diaphragm gauge |
| Temperature Range | -50~800℃ |
| Size(L×W×H) | 3.2m×3.3m×2.2m |
Multi-chamber Cluster Magnetron Sputter System SA-VKC500
In stock
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SKU:
SA-VKC550
| Number of Process Chambers(max.) | 5 |
|---|---|
| Process Chamber Type | Sputter & Degas & Pre-clean |
| Number of Sample Chambers(max.) | 2 |
| Autosampling Chamber | Integrated with BROOKS system |
| Ion Source | DC/RF ion source, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø300 mm |
| Uniform Etching Area(max.) | Ø200 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + Capacitance diaphragm gauge |
| Temperature Range | -50~500℃ |
| Size(L×W×H) | 3.73m×2.75m×2.2m |