Ā Ā Ā Ā Ā Ā SA-VK M360 is a compact magnetron sputtering system. It features a small footprint, highly automated controls and easy-maintenance design, satisfying R&D requirements for universities and research institutes while effectively boosting R&D efficiency.Ā
Ā Ā SA-VK M360 is a compact magnetron sputtering system. It features a small footprint, highly automated controls and easy-maintenance design, satisfying R&D requirements for universities and research institutes while effectively boosting R&D efficiency.
|
Feature |
Application |
|---|---|
|
|
Principleļ¼
Features
| Number of Cathodes(max.) | 4 |
|---|---|
| Uniform Deposition Area(max.) | Ć150āÆmm |
| Ultimate Vacuum | 1E-5Pa |
General
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
|---|---|
| Ion Source | RF & Kaufman & Hall ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | Ā±3% |
| Coating Repeatability | Ā±2% |
| Vacuum Measurement | Full-range vacuum gauge + āCapacitance diaphragm gauge |
| Temperature Range | RT~300ā |
| Size(LĆWĆH) | 1.6mĆ2.75mĆ1.8m |
In stock
| Number of Crucibles(max.) | 4 |
|---|---|
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | RF & Kaufman & Hall ion source |
| Fixture types | Dome & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | Ā±2% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć960āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~300ā |
| Size(LĆWĆH) | 4.4mĆ4.1mĆ2.6m |
In stock
| Number of Crucibles(max.) | 6 |
|---|---|
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45Ā°~45Ā°ļ¼adjustable |
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Kaufman & Hall ion source |
| Fixture types | Dome &Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | Ā±2% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć260āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~500ā |
| Size(LĆWĆH) | 3mĆ2.5mĆ2.2m |
In stock
| Number of Crucibles(max.) | 6 |
|---|---|
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45Ā°~45Ā°ļ¼adjustable |
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Kaufman & Hall ion source |
| Fixture types | Dome & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | Ā±2% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć300āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~500ā |
| Size(LĆWĆH) | 4.0mĆ3.1mĆ2.9m |
In stock
| Processing Position | Various fiber grating types |
|---|---|
| Wavelength | 1030nm, 515nm |
| Objective Lens | 60Ć/20Ć |
| Illumination | Reflection & Transmission |
| Functional Configuration | External energy adjustment, 2D motorized slit |
| Optional | Spatial Light Modulator (SLM), galvanometer scanner |
| Adjustment Stage | Motorized |
| Travel Range of Motion Stage | 100āÆmm Ć 100āÆmm |
| Fixture & Workstation | Fiber rotary fixture, oil reservoir, processing station for sheetāshaped materials |
| Automatic fiber winding | Partial-function automatic fiber winding |
In stock
| Number of Process Chambers(max.) | 5 |
|---|---|
| Process Chamber Type | Sputter & Degas & Pre-clean |
| Number of Sample Chambers(max.) | 2 |
| Autosampling Chamber | Integrated with BROOKS system |
| Ion Source | DC/RF ion source, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | Ā±2% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć300āÆmm |
| Uniform Etching Area(max.) | Ć200āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + āCapacitance diaphragm gauge |
| Temperature Range | -50~500ā |
| Size(LĆWĆH) | 3.73mĆ2.75mĆ2.2m |
In stock
| Power Supply(max.) | 8kW |
|---|---|
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45Ā°~45Ā°ļ¼adjustable |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Hall ion source |
| Fixture types | Dome & Knudsen & Plate |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | Ā±3% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć200āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | -50~500ā |
| Size(LĆWĆH) | 3.15mĆ2.4mĆ2.2m |
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