Showing all 4 results
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Femtosecond Laser 3D Micro-Nano Processing Equipment for Hard-and-Brittle Materials SA-FSD-500
In stock
SKU:
SA-FSD-500
| Processing Position | Patterned material modification and waveguide structures |
|---|---|
| Wavelength | 1030nm, 515nm |
| Objective Lens | 50×/20× |
| Illumination | Reflection & Transmission |
| Functional Configuration | External energy adjustment, 2D motorized slit |
| Optional | Spatial Light Modulator (SLM), auto-focus tracking |
| Adjustment Stage | Manual |
| Travel Range of Motion Stage | 200 mm × 200 mm |
| Fixture & Workstation | Large-area transparent adsorption stage |
Hot
Femtosecond Laser Micro-Nano Automatic Processing Equipment for Fiber Bragg Gratings SA-FSD-1000IR
In stock
SKU:
SA-FSD-1000IR
| Processing Position | Mass production of typical fiber gratings Kilometer-length fiber processing |
|---|---|
| Wavelength | 515nm |
| Objective Lens | 60× |
| Illumination | Transmission |
| Functional Configuration | External energy adjustment |
| Optional | Spatial Light Modulator (SLM), 2D motorized slit |
| Adjustment Stage | Motorized |
| Travel Range of Motion Stage | 100 mm × 100 mm |
| Fixture & Workstation | Automatic fixture for fiber grating fabrication |
| Automatic fiber winding | Full-function automatic fiber winding |
Femtosecond Laser Micro-Nano Multi-Functional Processing Equipment for Fiber Bragg Gratings SA-FSD-1000M
In stock
SKU:
SA-FSD-1000M
| Processing Position | Various fiber grating types |
|---|---|
| Wavelength | 1030nm, 515nm |
| Objective Lens | 60×/20× |
| Illumination | Reflection & Transmission |
| Functional Configuration | External energy adjustment, 2D motorized slit |
| Optional | Spatial Light Modulator (SLM), galvanometer scanner |
| Adjustment Stage | Motorized |
| Travel Range of Motion Stage | 100 mm × 100 mm |
| Fixture & Workstation | Fiber rotary fixture, oil reservoir, processing station for sheet‑shaped materials |
| Automatic fiber winding | Partial-function automatic fiber winding |
Hot
Multi-Photon 3D Laser Direct-Write Lithography System SA-MPD series
In stock
SKU:
SA-MPD series
| Wavelength | 515nm, 780nm |
|---|---|
| Lateral Minimum Feature Size Limit | 40 nm |
| Lateral Minimum Pitch Limit | 150 nm |
| Lateral Minimum Feature Size | XY ≤ 80 nm(MPD-100、MPD-1000), XY ≤ 50 nm(MPD-2000) |
| Lateral Minimum Pitch / Resolution | XY ≤ 300 nm(MPD-100、MPD-1000), XY ≤ 200 nm(MPD-2000) |
| Stitching Accuracy | ≤ 200 nm |
| Optimal Surface Roughness | ≤ 5 nm |
| High-Precision Auto-Focusing | Accuracy ≤25nm, compatible with both transparent and opaque substrates including silicon, glass, and sapphire |
| Focusing System | Standard: Total magnification 66×, NA 1.42(Other magnifications and specifications available upon request) |
| Power Supply | Power cable: 6 mm2 cross-section 220V AC, 50 Hz, 16 A |
| Peak Power / Operating Power | 4 kW/1 kW(MPD-100), 8 kW/4 kW(MPD-1000、MPD-2000) |
| Recommended Usage Area | 2 m×2 m |
| Size(L×W×H)or(D×W×H) | 1300mm×1300mm×2200mm, 940mm×785mm×720mm |
| Cabinet Dimensions(mm, W×D×H) | 620×800×160 |
| Weight | <1200kg, <600kg |
| Intelligent Strategies | 1.Contour/Shell Filling; 2.Arbitrary/Custom Sequence Mode; 3.Adaptive Slicing; 4.Vector Mode |
| Fixture/Substrate | 1.Including but not limited to metal, glass (quartz), sapphire, silicon wafers; 2.Compatible with multiple substrate fixturing methods: vacuum chucking, mechanical clamping, magnetic chucking; 3.Standard/Custom optical fiber fixtures |
| More Functions | Anchor points, Measurement, Fiducial marking, Tilt compensation, Rotation, etc. |
| Photoresist/Materials | 1.Self-developed two-photon photoresists, HBP, PPI-Dip, HBO-2, etc.; 2.Compatible with third-party two-photon photoresists and other photocurable materials, including but not limited to AZ series, SU-8 series; 3.Supports printing of biocompatible hydrogel materials; 4.Supports precursor photoresists for glass, PDMS and other functional materials |
| Average power | ≥ 1W |
| Pulse duration | ≤ 200 fs |
| Stage XYZ travel | 100 mm×100 mm×25 mm |
| High-precision Z-axis | Travel ≥75 μm; minimum step size ≤ 10 nm |
| Environmental Conditions | Yellow safelight; ISO Class 7(10,000) or better cleanroom; vibration isolation exceeding VC-C; Laboratory ambient tem- perature recommended at 21-23°C |
| Compressed Air | Not necessary, only for active vibration isolation and vacuum stage fixtures |