Showing 1–12 of 51 results
Automatic Ball Wire Bonder SA-BWB-6000PC
In stock
SKU:
SA-BWB-6000PC
| Bonding Accuracy | ±3 μm@3sigma |
|---|---|
| Bonding Stroke | X=60mm,Y=70mm |
| Length of Wire Bonding | ≤7mm |
| Loop Height Accuracy | ±25.4μm |
| Loop Types | Q-loop / SQ-loop / BGA-TWS |
| Spool Diameter | 50mm(2inches) |
| Bonding Force | 0~360g |
| Bonding Wire Type | Gold, Copper, CuPd, Ag, Alloy wire(18~50μm) |
| Bonding Speed | 45ms(2mm wire length) |
| Operating System | Windows |
| Optical System | Option between ×2~×4 and ×1.6~×3.6 times, both with programmable focus |
| Weight | 650Kg |
| Input Voltage | 220V±10%@50~60Hz |
| Power | 2KW |
| Compressed Air Requirement | ≥0.35MPa |
| Size(L×W×H)or(D×W×H) | 1000mm×1300mm×1700mm |
Automatic Ball Wire Bonder SA-BWB-6000Plus
In stock
SKU:
SA-BWB-6000Plus
| Bonding Accuracy | ±2 μm@3sigma |
|---|---|
| Bonding Stroke | X=60mm,Y=70mm(LF width ≤80mm) |
| Length of Wire Bonding | ≤7mm |
| Min Bond Pad Pitch | 45μm |
| Loop Types | Q-loop / SQ-loop / BGA-TWS |
| Spool Diameter | 50mm(2inches) |
| Wire Bonding Capacity(max.) | 30,000 wires/panel |
| Bonding Wire Type | Gold wire, copper wire, palladium-coated copper wire, silver wire, alloy wires(18~50μm) |
| Bonding Speed | 45ms(2mm wire line) |
| Operating System | Windows |
| Optical System | Option between ×2~×4 and ×1.6~×3.6 times, both with programmable focus |
| Weight | 650Kg |
| Input Voltage | 220V±10%@50~60Hz |
| Power | 2KW |
| Compressed Air Requirement | ≥0.35MPa |
| Size(L×W×H)or(D×W×H) | 1000mm×1300mm×1700mm |
Automatic Deep Access Wire Bonder SA-DAWB-6000B
In stock
SKU:
SA-DAWB-6000B
| Bonding Accuracy | ±3 μm@3sigma |
|---|---|
| Bonding Area | X-axis: 305 mm, Y-axis: 457 mm, rotation range: 0~180° |
| Ultrasonic | 0~4 W precise control with stepped flexible energy output |
| Loop Control | Fully programmable |
| Cavity Depth | 12mm(max.) |
| Bonding Force | 0~220g |
| Capillary Length | 16mm/19mm |
| Bonding Wire Type | Gold wire(18~75μm), copper wire (18~75 μm), selected alloy wires |
| Bonding Speed | ≥5wires/s |
| Operating System | Windows |
| Weight | 1.2T |
| Input Voltage | 220V±10%@50~60Hz |
| Power | 2KW |
| Compressed Air Requirement | ≥0.35MPa |
| Size(L×W×H)or(D×W×H) | 1500mm×1000mm×1700mm |
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Automatic Deep Access Wire Bonder SA-DAWB-6000W
In stock
SKU:
SA-DAWB-6000W
| Bonding Accuracy | ±3 μm@3sigma |
|---|---|
| Bonding Area | X-axis: 305 mm, Y-axis: 457 mm, rotation range: ±220° |
| Ultrasonic | 0~4 W precise control with stepped flexible energy output |
| Loop Control | Fully programmable |
| Cavity Depth | 16mm(max.) |
| Bonding Force | 0~220g |
| Capillary Length | 19mm/25mm |
| Bonding Wire Type | Gold wire(18~75μm), aluminum wire (18~75 μm), gold ribbon (12.7×50 μm ~ 25.4×300 μm), partial alloy wires |
| Bonding Speed | ≥5wires/s |
| Operating System | Windows |
| Weight | 1.2T |
| Input Voltage | 220V±10%@50~60Hz |
| Power | 2KW |
| Compressed Air Requirement | ≥0.35MPa |
| Size(L×W×H)or(D×W×H) | 1500mm×1000mm×1700mm |
Chain Magnetron Sputter System SA-VKI2000
In stock
SKU:
SA-VKI2000
| Number of Cathodes(max.) | 2 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Ion Source | Anode & Kaufman & RF ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | ±3% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | 1000 mm×1000 mm |
| Ultimate Vacuum | 3E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + Capacitance diaphragm gauge |
| Temperature Range | RT~300℃ |
| Size(L×W×H)or(D×W×H) | 5m×2.8m×1.6m |
Dielectric Etcher SA-NMC508SDH/SDL
In stock
SKU:
SA-NMC508SDH/SDL
| Wafer Size | 6″, 8″ |
|---|---|
| Etching Materials | Dielectric SiNx, Dielectric SiO2, Dielectric SiON |
| Processes | FEOL/BEOL(HM/CT/Spacer/Via/PAD) |
| SHD | Si(SDH), Al-Y2O3 coating(SDL) |
| Gas Injection | Dual zone inject(10-90% adj) |
| Temp Control | Chiller |
| Cathode | Dual zone ESC |
| Process Mode | Clean Mode(SDL) |
| Etch Rate(ER) | > 4500 A/min(SDH), >6000 A/min(SDL) |
| Sidewall Roughness | < 1 nm(SDH) |
| U% | WIW < 3% @ EE3mm, WTW < 3% |
| WPH | ~ 10 @15K(SDH), 12 @10K(SDL) |
| COC | 1 |
| MTTR | <1h(SDH) |
| MTBC | > 200 RFh(SDH), > 150 RFh(SDL) |
| Size(L×W×H)or(D×W×H) | 3279mm×3253mm×2339mm |
Electron Beam Evaporation System SA-VKE1100/E1500
In stock
SKU:
SA-VKE1100/E1500
| Number of Crucibles(max.) | 8 |
|---|---|
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | RF & Kaufman & Hall ion source |
| Fixture types | Dome & Knudsen & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø300 mm |
| Ultimate Vacuum | 2E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~300℃ |
| Size(L×W×H)or(D×W×H) | 4.05m×3.9m×2.8m |
Electron Beam Evaporation System SA-VKE1100D/E1500D
In stock
SKU:
SA-VKE1100D/E1500D
| Number of Crucibles(max.) | 4 |
|---|---|
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | RF & Kaufman & Hall ion source |
| Fixture types | Dome & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø960 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~300℃ |
| Size(L×W×H)or(D×W×H) | 4.4m×4.1m×2.6m |
Electron Beam Evaporation System SA-VKE1500Pro
In stock
SKU:
SA-VKE1500Pro
| Number of Crucibles(max.) | 8 |
|---|---|
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | RF & Kaufman & Hall ion source |
| Fixture types | Dome & Knudsen & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | 12×Ø200 mm |
| Ultimate Vacuum | 2E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~200℃ |
| Size(L×W×H)or(D×W×H) | 8.5m×5.5m×3.3m |
Electron Beam Evaporation System SA-VKE360
In stock
SKU:
SA-VKE360
| Number of Crucibles(max.) | 6 |
|---|---|
| Power Supply(max.) | 10kW |
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45°~45°，adjustable |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Hall ion source |
| Fixture types | Dome & Plate |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±3% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø200 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | -50~300℃ |
| Size(L×W×H)or(D×W×H) | 3.15m×2.4m×2.2m |