Multi-chamber Cluster Magnetron Sputter System SA-VKC500

SKU: SA-VKC500

    SA-VKC500 is a production-grade multi-chamber cluster magnetron sputter system. Featuring robust construction, high operational stability and reliability, as well as a highly automated control system, it is capable of meeting mass-production requirements for semiconductor-grade manufacturing.

Description

    SA-VKC500 is a production-grade multi-chamber cluster magnetron sputter system. Featuring robust construction, high operational stability and reliability, as well as a highly automated control system, it is capable of meeting mass-production requirements for semiconductor-grade manufacturing.

Feature

Application

  • Independent chambers
  • Minimize cross-contamination
  • Multi-functional integration
  • High process efficiency
  • Laser
  • R&D
  • Intergated circuit
  • MEMS

Principle:

Specification

Features

Ultimate Vacuum1E-5Pa

General

Process Chamber TypeSputter & Degas & Pre-clean
Autosampling ChamberIntegrated with BROOKS system
Ion SourceDC/RF ion source, optional
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow ControlDigital mass flow meter
Coating Uniformity±2%
Coating Repeatability±2%
Uniform Etching Area(max.)Ø200 mm
Vacuum MeasurementFull-range vacuum gauge + ‌Capacitance diaphragm gauge
Temperature Range-50~500℃
Size(L×W×H)or(D×W×H)3.73m×2.75m×2.2m

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