Ā Ā SA-VKC500 is a production-grade multi-chamber cluster magnetron sputter system. Featuring robust construction, high operational stability and reliability, as well as a highly automated control system, it is capable of meeting mass-production requirements for semiconductor-grade manufacturing.
|
Feature |
Application |
|---|---|
|
|
Principleļ¼
Features
| Number of Process Chambers(max.) | 5 |
|---|---|
| Number of Sample Chambers(max.) | 2 |
| Uniform Deposition Area(max.) | Ć300āÆmm |
| Uniform Etching Area(max.) | Ć200āÆmm |
| Ultimate Vacuum | 1E-5Pa |
General
| Process Chamber Type | Sputter & Degas & Pre-clean |
|---|---|
| Autosampling Chamber | Integrated with BROOKS system |
| Ion Source | DC/RF ion source, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | Ā±2% |
| Coating Repeatability | Ā±2% |
| Vacuum Measurement | Full-range vacuum gauge + āCapacitance diaphragm gauge |
| Temperature Range | -50~500ā |
| Size(LĆWĆH) | 3.73mĆ2.75mĆ2.2m |
In stock
| Number of Cathodes(max.) | 2 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Ion Source | Anode & Kaufman & RF ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | Ā±3% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | 1000āÆmmĆ1000āÆmm |
| Ultimate Vacuum | 3E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + āCapacitance diaphragm gauge |
| Temperature Range | RT~300ā |
| Size(LĆWĆH) | 5mĆ2.8mĆ1.6m |
In stock
| Number of Crucibles(max.) | 6 |
|---|---|
| Power Supply(max.) | 10kW |
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45Ā°~45Ā°ļ¼adjustable |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Hall ion source |
| Fixture types | Dome & Plate |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | Ā±3% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć200āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | -50~300ā |
| Size(LĆWĆH) | 3.15mĆ2.4mĆ2.2m |
In stock
| Processing Position | Various fiber grating types |
|---|---|
| Wavelength | 1030nm, 515nm |
| Objective Lens | 60Ć/20Ć |
| Illumination | Reflection & Transmission |
| Functional Configuration | External energy adjustment, 2D motorized slit |
| Optional | Spatial Light Modulator (SLM), galvanometer scanner |
| Adjustment Stage | Motorized |
| Travel Range of Motion Stage | 100āÆmm Ć 100āÆmm |
| Fixture & Workstation | Fiber rotary fixture, oil reservoir, processing station for sheetāshaped materials |
| Automatic fiber winding | Partial-function automatic fiber winding |
In stock
| Wafer Size | 6″, 8″ |
|---|---|
| Etching Materials | Si, PolySi |
| Processes | Poly EB/STI/Poly gate/CT Si |
| Coil | Dual Zone |
| Match Mode | L-Match |
| Magnetic Shield | Yes |
| Gas Injector | Dual Zone |
| FRC | Yes |
| Liner | Symmetric Grid |
| Edge Ring | CIP version |
| ESC | Dual Zone |
| ESC Materials | Ceramic |
| Lift Pin | Ceramic |
| Turbo | 1600L/s |
| Chamber | Symmetric |
| Size(LĆWĆH) | 3279mmĆ3253mmĆ2339mm |
In stock
| Power Supply(max.) | 8kW |
|---|---|
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45Ā°~45Ā°ļ¼adjustable |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Hall ion source |
| Fixture types | Dome & Knudsen & Plate |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | Ā±3% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć200āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | -50~500ā |
| Size(LĆWĆH) | 3.15mĆ2.4mĆ2.2m |
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