Magnetron Sputter System SA-VKM800
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Magnetron Sputter System SA-VKM600/M700 - Image 1
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Magnetron Sputter System SA-VKM600/M700
Magnetron Sputter System SA-VKM600/M700 - Image 2
Magnetron Sputter System SA-VKM600/M700 - Image 3

Magnetron Sputter System SA-VKM600/M700

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SKU: SA-VKM600/M700

Ā Ā Ā Ā Ā Ā SA-VKM600 and SA-VKM700 are general-purpose magnetron sputter systems. Delivering high-performance, stable and reliable operation, they feature a high-level automated control system and easy-maintenance design to satisfy diverse magnetron sputtering process requirements for both production and R&D.Ā 

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Description

Datasheet

Ā  Ā  SA-VKM600 and SA-VKM700 are general-purpose magnetron sputter systems. Delivering high-performance, stable and reliable operation, they feature a high-level automated control system and easy-maintenance design to satisfy diverse magnetron sputtering process requirements for both production and R&D.

Feature

Application
  • High thin-film purity
  • Excellent substrate adhesion
  • Relatively high ionization rate
  • Co-sputtering with mixed targets
  • Laser
  • R&D
  • Intergated circuit
  • MEMS

Principleļ¼š

Specification

Features

Number of Cathodes(max.)5
Uniform Deposition Area(max.)Ƙ300ā€Æmm
Ultimate Vacuum8E-6Pa

General

Sputtering Power SupplyDC / RF / pulsed DC, freely switchable
BiasRF / pulsed DC
Vacuum Sampling ChamberSingle-wafer / multi-wafer fully-automatic sampling chamber, optional
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow ControlDigital mass flow meter
Coating UniformityĀ±2%
Coating RepeatabilityĀ±2%
Vacuum MeasurementFull-range vacuum gauge + ā€ŒCapacitance diaphragm gauge
Temperature Range-50~800ā„ƒ
Size(LƗWƗH)3.2mƗ3.3mƗ2.2m

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