Fully automatic single wafer cleaner SA-SWC-48LS

SKU: SA-SWC-48LS

      SA-SWC-48LS is suitable for various semiconductor materials and compatible with multiple wafer sizes. The optimized chamber creates a stable working environment and prevents cross-contamination of chemicals. It supports mainstream industrial protocols and system connection. With outstanding adaptability, it meets diverse etching and cleaning demands in semiconductor manufacturing. 

Description

SA-SWC-48LS is suitable for various semiconductor materials and compatible with multiple wafer sizes. The optimized chamber creates a stable working environment and prevents cross-contamination of chemicals. It supports mainstream industrial protocols and system connection. With outstanding adaptability, it meets diverse etching and cleaning demands in semiconductor manufacturing.

Feature

Application

  • Accommodate Multiple Sizes
  • A Stable Downflow
  • Preventing Cross-Contamination of Chemical Agents
  • Support GEM/SECS procols
  • Support MES system
  • Si/SiC/GaN
  • Substrate and Epitaxial Cleaning
  • Photoresist Stripping
  • Oxide Removal

Specification

Features

Wafer Size4″&6″, 6″&8″, 8″&12″

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