Fully automatic RCA cleaning manchine SA-RCA-48LS

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SKU: SA-RCA-48LS

SA-RCA-48LS is crafted with premium materials to endure acidic corrosive working environments. Adopting modular tank design and advanced automatic manipulators, it delivers stable and consistent cleaning performance for semiconductor wafers. Equipped with high-end control components and compatible with MES systems, it realizes intelligent operation. With reliable leakage prevention and optimized ventilation design, it ensures safe, efficient and eco-friendly operation, perfectly meeting the rigorous cleaning demands of the semiconductor industry.

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Description

Datasheet

SA-RCA-48LS is crafted with premium materials to endure acidic corrosive working environments. Adopting modular tank design and advanced automatic manipulators, it delivers stable and consistent cleaning performance for semiconductor wafers. Equipped with high-end control components and compatible with MES systems, it realizes intelligent operation. With reliable leakage prevention and optimized ventilation design, it ensures safe, efficient and eco-friendly operation, perfectly meeting the rigorous cleaning demands of the semiconductor industry.

Feature	Application
Long-time Acidic Corrosion Resistant Double-layer Leak-proof Customize for Manual and Fully Automatic Support MES system ISO9001 Quality Assurance	Wafer Front-End Cleaning Photolithography Cleaning Etch Post-Cleaning Thin Film Cleaning Back-End Packaging

Specification

Features

Wafer Size	8″, 12″, 4″, 5″, 6″

General

Cleaning Capacity	4″~8″:25pieces2baskets/batch, 12″:25pieces/batch
Control Part	PLC and HMI

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Wafer Size	6″, 8″
Processing Capacity	50 wafers /tank time
Solution Temperature	50℃~80℃±1℃
Megasonic Cleaning	950KHz,400W
Solution Accuracy Error	≤ 1%
Metal Ions	≤ 5E10 atoms/cm2
Particle Control	≤ 10 pieces/wafer@0.3μm, ≤ 20 pieces/wafer@0.2μm
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