SA-WEM-48LS features a specially designed rotating mechanism for steady immersion processing. It delivers highly uniform etching results and adopts circulating filtration to reuse chemical liquids. With intelligent temperature control and gas regulating functions, it works efficiently. It supports data interconnection with management systems and has comprehensive protection designs to safeguard wafers during operation.
SA-WEM-48LS features a specially designed rotating mechanism for steady immersion processing. It delivers highly uniform etching results and adopts circulating filtration to reuse chemical liquids. With intelligent temperature control and gas regulating functions, it works efficiently. It supports data interconnection with management systems and has comprehensive protection designs to safeguard wafers during operation.
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Feature |
Application |
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Features
| Wafer Size | 4″~12″ |
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General
| Ness Increment | δTTV≤1.5μm |
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| Cleaning Capacity | 6″:75pieces/time, 8″/12″:50pieces/time |
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