Fully automatic slot developing manchine SA-SDM-48LS
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Vertical Furnace SA-Flouris X201H/P - Image 1
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Vertical Furnace SA-Flouris X201H/P
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Vertical Furnace SA-Flouris X201H/P

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SKU: SA-Flouris X201H/P

Ā Ā Ā Ā Ā Ā SA-FLOURIS X201H/P is a vertical batch furnace for 6/8-inch Si, SiC and GaN wafers, covering gate oxide, FOX, BPSG reflow and multi-type annealing processes. It delivers Ā±1ā„ƒ precise temperature control and ultra-fine film thickness uniformity below 0.6% WIW. Strict metal contamination and particle management enable stable mass production for power, logic and MEMS semiconductor manufacturing.Ā 

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Description

Datasheet
SA-FLOURIS X201H/P is a vertical batch furnace for 6/8-inch Si, SiC and GaN wafers, covering gate oxide, FOX, BPSG reflow and multi-type annealing processes. It delivers Ā±1ā„ƒ precise temperature control and ultra-fine film thickness uniformity below 0.6% WIW. Strict metal contamination and particle management enable stable mass production for power, logic and MEMS semiconductor manufacturing.

Feature

Application
  • Precision Temperature Control
  • Superior uniformity
  • Flexible batch capacity options
  • Mass Production
  • Logic
  • Power
  • Si/SiC/GaN
  • MEMS

Packageļ¼š

Performanceļ¼š

Thickness uniformity results(49Point,EE3mm)

Monitor Position

Slot15

Slot50

Slot90

Slot130

Slot167

Average

[ƅ]

2261.9

2256.9

2259.5

2262.7

2260.1

Range

[ƅ]

26.19

15.23

12.50

7.85

4.01

Stdev.

[ƅ]

8.95

4.67

4.14

2.78

1.43

WIW Unif

[Ā±%]

0.58

0.34

0.28

0.17

0.09

WTW Unif

[Ā±%]

0.13

Thickness uniformity diagram

Total

Specification

Features

Wafer Size6″, 8″

General

ProcessFOX/STI Anneal/Pad-Oxide/Gate Oxide/BPSG Reflow/Final Alloy/Cu Anneal/N2 Anneal/Polyimide Cure
Compatible MaterialsSi, SiC, GaN
Teamperature Control Accuracyā‰¤Ā±1ā„ƒ
Flat Zone Length860mm
Batch Size150/125
SMIF/Open Cassette/OHTOption
N2 Load LockOption
AGCOption
Particle Controlā‰¤20@0.16Ī¼m
Uniformity(WIW/WTW/LTL)ā‰¤2%/1.5%/1.5%
Metal Contamination (ICP-MS/TXRF)5E10
Loccalization ProgressContinuous improvement
Size(LƗWƗH)4420mmƗ900mmƗ3302mm, 4093mmƗ900mmƗ3302mm

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