Showing all 6 results

Magnetron Sputter System

Chain Magnetron Sputter System SA-VKI2000

In stock

SKU: SA-VKI2000
Number of Cathodes(max.)2
Sputtering Power SupplyDC / RF / pulsed DC, freely switchable
Ion SourceAnode & Kaufman & RF ion source
BiasRF / pulsed DC
Vacuum Sampling ChamberFully-automatic sampling chamber, optional
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow ControlDigital mass flow meter
Coating Uniformity±3%
Coating Repeatability±2%
Uniform Deposition Area(max.)1000 mm×1000 mm
Ultimate Vacuum3E-5Pa
Vacuum MeasurementFull-range vacuum gauge + ‌Capacitance diaphragm gauge
Temperature RangeRT~300℃
Size(L×W×H)5m×2.8m×1.6m

Magnetron Sputter System SA-VKM360

In stock

SKU: SA-VKM360
Number of Cathodes(max.)4
Sputtering Power SupplyDC / RF / pulsed DC, freely switchable
Ion SourceRF & Kaufman & Hall ion source
BiasRF / pulsed DC
Vacuum Sampling Chamberoptional
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow ControlDigital mass flow meter
Coating Uniformity±3%
Coating Repeatability±2%
Uniform Deposition Area(max.)Ø150 mm
Vacuum MeasurementFull-range vacuum gauge + ‌Capacitance diaphragm gauge
Ultimate Vacuum1E-5Pa
Temperature RangeRT~300℃
Size(L×W×H)1.6m×2.75m×1.8m

Magnetron Sputter System SA-VKM600/M700

In stock

SKU: SA-VKM600/M700
Number of Cathodes(max.)5
Sputtering Power SupplyDC / RF / pulsed DC, freely switchable
BiasRF / pulsed DC
Vacuum Sampling ChamberSingle-wafer / multi-wafer fully-automatic sampling chamber, optional
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow ControlDigital mass flow meter
Coating Uniformity±2%
Coating Repeatability±2%
Uniform Deposition Area(max.)Ø300 mm
Ultimate Vacuum8E-6Pa
Vacuum MeasurementFull-range vacuum gauge + ‌Capacitance diaphragm gauge
Temperature Range-50~800℃
Size(L×W×H)3.2m×3.3m×2.2m

Magnetron Sputter System SA-VKM800

In stock

SKU: SA-VKM800
Number of Cathodes(max.)4
Sputtering Power SupplyDC / RF / pulsed DC, freely switchable
Ion SourceRF & Kaufman & Hall ion source
BiasRF / pulsed DC
Vacuum Sampling ChamberMulti-wafer fully-automatic sampling chamber, optional
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow ControlDigital mass flow meter
Coating Uniformity±1.5%
Coating Repeatability±2%
Uniform Deposition Area(max.)5ר300 mm
Ultimate Vacuum1E-5Pa
Vacuum MeasurementFull-range vacuum gauge + ‌Capacitance diaphragm gauge
Temperature Range-50~800℃
Size(L×W×H)3.2m×3.3m×2.2m

Multi-chamber Cluster Magnetron Sputter System SA-VKC500

In stock

SKU: SA-VKC500
Process Chamber TypeSputter & Degas & Pre-clean
Autosampling ChamberIntegrated with BROOKS system
Ion SourceDC/RF ion source, optional
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow ControlDigital mass flow meter
Coating Uniformity±2%
Coating Repeatability±2%
Uniform Etching Area(max.)Ø200 mm
Ultimate Vacuum1E-5Pa
Vacuum MeasurementFull-range vacuum gauge + ‌Capacitance diaphragm gauge
Temperature Range-50~500℃
Size(L×W×H)3.73m×2.75m×2.2m

Reactive Magnetron Sputter System SA-VKV500

In stock

SKU: SA-VKV500
Number of Cathodes(max.)2
Sputtering Power SupplyDC / RF / pulsed DC, freely switchable
Ion SourceRF & Kaufman & Hall ion source
BiasRF / pulsed DC
Vacuum Sampling ChamberSingle-wafer/multi-wafer fully-automatic sampling chamber, optional
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow ControlDigital mass flow meter
Coating Uniformity±2%
Coating Repeatability±2%
Uniform Deposition Area(max.)Ø200 mm
Ultimate Vacuum1E-5Pa
Vacuum MeasurementFull-range vacuum gauge + ‌Capacitance diaphragm gauge
Temperature Range-50~800℃
Size(L×W×H)3.8m×2.8m×2.2m