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385nm
Digital Projection Maskless Lithography System SA-UVD
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In stock
SKU:
SA-UVD
| Wavelength | 385nm, 405nm |
|---|---|
| Direct-write Resolution | 500nm |
| Writing Speed | 10 mm2/min |
| Maximum Substrate Size | 8-inch |
| Substrate Thickness | 0.1 mm ~ 8 mm |
| Maximum Exposure Area | 200 mm × 200 mm |
| Grayscale Level | 256, 1024, 2048, 4096 |
| Auto-focusing Range | 70 μm |
| Objective Lens | 5×, 10×, 20×, 50× |
| Writing & Slicing Software | Supports multiple formats including JPG, TIFF, and GDS. |
| Scripted Writing Mode | Provides a scripted programming interface to support user-defined processing structures. |
| Online Drawing Processing Mode | Supports real-time online drawing; allows direct drawing of custom graphics on the live sample image. |
| Real-time Auto-focusing | Optical focusing |
| Electrical Conditions | 230VAC±5%, 50/60 Hz, 10 A |
| Environmental Conditions | Temperature: 21±1°C;Relative Humidity: 40%~60%, non-condensing |
| Compressed Air | 6~9 bar, tolerance±0.5 bar |
| Ambient Lighting | Yellow light |
| Cleanliness Level | Class 1000 cleanroom |
| Size(L×W×H)or(D×W×H) | 940mm×850mm×1470mm |
| Weight | 250kg |