Showing all 3 results
Hot
Digital Projection Maskless Lithography System SA-UVD
In stock
SKU:
SA-UVD
| Wavelength | 385nm, 405nm |
|---|---|
| Direct-write Resolution | 500nm |
| Writing Speed | 10 mm2/min |
| Maximum Substrate Size | 8-inch |
| Substrate Thickness | 0.1 mm ~ 8 mm |
| Maximum Exposure Area | 200 mm × 200 mm |
| Grayscale Level | 256, 1024, 2048, 4096 |
| Auto-focusing Range | 70 μm |
| Objective Lens | 5×, 10×, 20×, 50× |
| Writing & Slicing Software | Supports multiple formats including JPG, TIFF, and GDS. |
| Scripted Writing Mode | Provides a scripted programming interface to support user-defined processing structures. |
| Online Drawing Processing Mode | Supports real-time online drawing; allows direct drawing of custom graphics on the live sample image. |
| Real-time Auto-focusing | Optical focusing |
| Electrical Conditions | 230VAC±5%, 50/60 Hz, 10 A |
| Environmental Conditions | Temperature: 21±1°C;Relative Humidity: 40%~60%, non-condensing |
| Compressed Air | 6~9 bar, tolerance±0.5 bar |
| Ambient Lighting | Yellow light |
| Cleanliness Level | Class 1000 cleanroom |
| Size(L×W×H)or(D×W×H) | 940mm×850mm×1470mm |
| Weight | 250kg |
Hot
Tomographic Volumetric Bioprinting System SA-VOP
In stock
SKU:
SA-VOP
| Wavelength | 405nm |
|---|---|
| Maximum Processing Size | ø40 mm×120 mm |
| Feature Accuracy | 200 μm |
| Processing Speed | 15 s~5 min/piece |
| Projection Resolution | 4K (3840×2160) |
| Projection Accuracy | 35 µm |
| Working Distance | 188 mm~221 mm |
| Optical Power Density | 64.4 mW/cm2 |
| Maximum Rotation Speed | 200 r/min |
| Minimum Step Angle | 0.02° |
| Angular Transmission Accuracy | 2 arcmin (0.033°) |
| Repeat Positioning Accuracy | ±15 arcsec (0.004°) |
| Allowable Axial Load | 4000 N |
| XYZ Triaxial Stroke | 350 mm×350 mm×100 mm |
| XYZ Triaxial Positioning Accuracy | 0.1 mm |
| Resolution | 2448×2048 |
| Pixel Size | 3.45 µm |
| Maximum Frame Rate | 60.0 fps |
| Processing Structure Type | Arbitrary 3D and 2.5D structures |
| Applicable Consumables | 405 nm-responsive photocurable materials (hydrogel, GelMA, engineering resin, photocurable glass, etc.) |
| Other Functions | Refractive index matching, automatic rotation axis alignment, real-time printing monitoring, automatic material assembly, etc. |
| Size(L×W×H)or(D×W×H) | 600mm×800mm×600mm |
Hot
Ultraviolet Laser Direct-Write Lithography System SA-AOD-M1000
In stock
SKU:
SA-AOD-M1000
| Wavelength | 375nm, 405nm |
|---|---|
| Minimum Feature Size | 300nm |
| Overlay Accuracy | 300nm |
| Focusing Range | 100 μm |
| Long-term Power stability | ±1% |
| Maximum Supported Substrate Size | 8-inch standard wafer, 200 mm × 200 mm planar substrate |
| Supported Substrate Thickness | 0.1 mm ~ 15 mm |
| Maximum Exposure Area | 200 mm × 200 mm |
| Temperature Control Stability | ±0.1°C (core optical cavity constant temperature control) |
| Exposure Grayscale Level | 4096 levels, wi th high-precision exposure dose closed-loop control |
| UV Special Objective Lens | Optional magnification: 5×, 10×, 20×, 50×, 100×; flat-field apochromatic design for UV band; core numerical aperture (NA) fully matches the resolution requirements of each magnification. |
| Pattern Writing Layout Data Preprocessing Software | Supports industry-standard vector layout formats including GDSII and OASIS; provides compatible conversion and preprocessing for bitmap formats (JPG, TIFF, BMP) for auxiliary pattern design; built-in stitching, exposure dose compensation, and Optical Proximity Correction. |
| Electrical Conditions | 230VAC±5%, 50/60 Hz, 16 A,single-phase |
| Environmental Conditions | Temperature: 21±1°C; Relative Humidity: 40%~60%, non-condensing |
| Compressed Air | 6~9 bar, pressure fluctuation ≤ ±0.5 bar; oil-free, water-free, Class 0 clean compressed air; dew point ≤ -20°C |
| Ambient Lighting | Yellow light environment (wavelength > 500 nm), no UV light leakage |
| Cleanroom Requirement | ISO Class 6 (Class 1000) cleanroom |
| Size(L×W×H)or(D×W×H) | 1320mm×1320mm×2000mm |
| Weight | 1100kg |