Tomographic Volumetric Bioprinting System SA-VOP
Tomographic Volumetric Bioprinting System SA-VOP
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Ultraviolet Laser Direct-Write Lithography System SA-AOD-M1000
Ultraviolet Laser Direct-Write Lithography System SA-AOD-M1000
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Digital Projection Maskless Lithography System SA-UVD - Image 1
Digital Projection Maskless Lithography System SA-UVD - Image 2
Digital Projection Maskless Lithography System SA-UVD - Image 3
Digital Projection Maskless Lithography System SA-UVD
Digital Projection Maskless Lithography System SA-UVD - Image 2
Digital Projection Maskless Lithography System SA-UVD - Image 3

Digital Projection Maskless Lithography System SA-UVD

SKU: SA-UVD

    The SA-UVD digital projection maskless lithography system adopts digital micro-mirror technology for high-speed maskless pattern generation, achieving a minimum feature size of 500 nm.
Equipped with high-precision real-time focusing and visual alignment overlay technology, it is mainly used for rapid prototyping in the fields of MEMS, photonic devices, quantum computing chips, and sensors.

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Description

Datasheet

    The SA-UVD digital projection maskless lithography system adopts digital micro-mirror technology for high-speed maskless pattern generation, achieving a minimum feature size of 500 nm.
Equipped with high-precision real-time focusing and visual alignment overlay technology, it is mainly used for rapid prototyping in the fields of MEMS, photonic devices, quantum computing chips, and sensors.

Feature

Application
    • DMD-driven exposure
    • Rapid prototyping
    • Visual alignment
    • Multi-grayscale output
    • MEMS
    • Photonic devices
    • Quantum computing chips
    • Sensors
Processing Cases：
2.5D structures2.5D structures
2D structures

Specification

Features

Wavelength

General

Direct-write Resolution500nm
Writing Speed10 mm2/min
Maximum Substrate Size8-inch
Substrate Thickness0.1 mm ~ 8 mm
Maximum Exposure Area200 mm × 200 mm
Grayscale Level256, 1024, 2048, 4096
Auto-focusing Range70 μm
Objective Lens5×, 10×, 20×, 50×
Writing & Slicing SoftwareSupports multiple formats including JPG, TIFF, and GDS.
Scripted Writing ModeProvides a scripted programming interface to support user-defined processing structures.
Online Drawing Processing ModeSupports real-time online drawing; allows direct drawing of custom graphics on the live sample image.
Real-time Auto-focusingOptical focusing
Electrical Conditions230VAC±5%, 50/60 Hz, 10 A
Environmental ConditionsTemperature: 21±1°C;Relative Humidity: 40%~60%, non-condensing
Compressed Air6~9 bar, tolerance±0.5 bar
Ambient LightingYellow light
Cleanliness LevelClass 1000 cleanroom
Size(L×W×H)or(D×W×H)940mm×850mm×1470mm
Weight250kg

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