Showing 1–12 of 33 results
Fabrication solutions integrate key processes for semiconductor and optoelectronic device manufacturing. With reliable process coordination and precise parameter control, they support the full-cycle production of high-performance chips and optical components.
Chain Magnetron Sputter System SA-VKI2000
SKU:
SA-VKI2000
In stock
Login to see prices| Number of Cathodes(max.) | 2 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Ion Source | Anode & Kaufman & RF ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | ±3% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | 1000 mm×1000 mm |
| Ultimate Vacuum | 3E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + Capacitance diaphragm gauge |
| Temperature Range | RT~300℃ |
| Size(L×W×H)or(D×W×H) | 5m×2.8m×1.6m |
Dielectric Etcher SA-NMC508SDH/SDL
SKU:
SA-NMC508SDH/SDL
In stock
Login to see prices| Wafer Size | 6″, 8″ |
|---|---|
| Etching Materials | Dielectric SiNx, Dielectric SiO2, Dielectric SiON |
| Processes | FEOL/BEOL(HM/CT/Spacer/Via/PAD) |
| SHD | Si(SDH), Al-Y2O3 coating(SDL) |
| Gas Injection | Dual zone inject(10-90% adj) |
| Temp Control | Chiller |
| Cathode | Dual zone ESC |
| Process Mode | Clean Mode(SDL) |
| Etch Rate(ER) | > 4500 A/min(SDH), >6000 A/min(SDL) |
| Sidewall Roughness | < 1 nm(SDH) |
| U% | WIW < 3% @ EE3mm, WTW < 3% |
| WPH | ~ 10 @15K(SDH), 12 @10K(SDL) |
| COC | 1 |
| MTTR | <1h(SDH) |
| MTBC | > 200 RFh(SDH), > 150 RFh(SDL) |
| Size(L×W×H)or(D×W×H) | 3279mm×3253mm×2339mm |
Hot
Digital Projection Maskless Lithography System SA-UVD
SKU:
SA-UVD
In stock
Login to see prices| Wavelength | 385nm, 405nm |
|---|---|
| Direct-write Resolution | 500nm |
| Writing Speed | 10 mm2/min |
| Maximum Substrate Size | 8-inch |
| Substrate Thickness | 0.1 mm ~ 8 mm |
| Maximum Exposure Area | 200 mm × 200 mm |
| Grayscale Level | 256, 1024, 2048, 4096 |
| Auto-focusing Range | 70 μm |
| Objective Lens | 5×, 10×, 20×, 50× |
| Writing & Slicing Software | Supports multiple formats including JPG, TIFF, and GDS. |
| Scripted Writing Mode | Provides a scripted programming interface to support user-defined processing structures. |
| Online Drawing Processing Mode | Supports real-time online drawing; allows direct drawing of custom graphics on the live sample image. |
| Real-time Auto-focusing | Optical focusing |
| Electrical Conditions | 230VAC±5%, 50/60 Hz, 10 A |
| Environmental Conditions | Temperature: 21±1°C;Relative Humidity: 40%~60%, non-condensing |
| Compressed Air | 6~9 bar, tolerance±0.5 bar |
| Ambient Lighting | Yellow light |
| Cleanliness Level | Class 1000 cleanroom |
| Size(L×W×H)or(D×W×H) | 940mm×850mm×1470mm |
| Weight | 250kg |
Electron Beam Evaporation System SA-VKE1100/E1500
SKU:
SA-VKE1100/E1500
In stock
Login to see prices| Number of Crucibles(max.) | 8 |
|---|---|
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | RF & Kaufman & Hall ion source |
| Fixture types | Dome & Knudsen & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø300 mm |
| Ultimate Vacuum | 2E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~300℃ |
| Size(L×W×H)or(D×W×H) | 4.05m×3.9m×2.8m |
Electron Beam Evaporation System SA-VKE1100D/E1500D
SKU:
SA-VKE1100D/E1500D
In stock
Login to see prices| Number of Crucibles(max.) | 4 |
|---|---|
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | RF & Kaufman & Hall ion source |
| Fixture types | Dome & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø960 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~300℃ |
| Size(L×W×H)or(D×W×H) | 4.4m×4.1m×2.6m |
Electron Beam Evaporation System SA-VKE1500Pro
SKU:
SA-VKE1500Pro
In stock
Login to see prices| Number of Crucibles(max.) | 8 |
|---|---|
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | RF & Kaufman & Hall ion source |
| Fixture types | Dome & Knudsen & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | 12×Ø200 mm |
| Ultimate Vacuum | 2E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~200℃ |
| Size(L×W×H)or(D×W×H) | 8.5m×5.5m×3.3m |
Electron Beam Evaporation System SA-VKE360
SKU:
SA-VKE360
In stock
Login to see prices| Number of Crucibles(max.) | 6 |
|---|---|
| Power Supply(max.) | 10kW |
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45°~45°，adjustable |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Hall ion source |
| Fixture types | Dome & Plate |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±3% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø200 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | -50~300℃ |
| Size(L×W×H)or(D×W×H) | 3.15m×2.4m×2.2m |
Electron Beam Evaporation System SA-VKE500D
SKU:
SA-VKE500D
In stock
Login to see prices| Number of Crucibles(max.) | 6 |
|---|---|
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45°~45°，adjustable |
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Kaufman & Hall ion source |
| Fixture types | Dome &Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø260 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~500℃ |
| Size(L×W×H)or(D×W×H) | 3m×2.5m×2.2m |
Electron Beam Evaporation System SA-VKE550/E800
SKU:
SA-VKE500/E800
In stock
Login to see prices| Number of Crucibles(max.) | 8 |
|---|---|
| Power Supply(max.) | 10kW |
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | RF & Kaufman & Hall ion source |
| Fixture types | Dome & Knudsen & Planetary &Plate |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±3% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø300 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~300℃ |
| Size(L×W×H)or(D×W×H) | 3.35m×2.8m×2.2m |
Electron Beam Evaporation System SA-VKE800D
SKU:
SA-VKE800D
In stock
Login to see prices| Number of Crucibles(max.) | 6 |
|---|---|
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45°~45°，adjustable |
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Kaufman & Hall ion source |
| Fixture types | Dome & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø300 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~500℃ |
| Size(L×W×H)or(D×W×H) | 4.0m×3.1m×2.9m |
Hot
Femtosecond Laser 3D Micro-Nano Processing Equipment for Hard-and-Brittle Materials SA-FSD-500
SKU:
SA-FSD-500
In stock
Login to see prices| Processing Position | Patterned material modification and waveguide structures |
|---|---|
| Wavelength | 1030nm, 515nm |
| Objective Lens | 50×/20× |
| Illumination | Reflection & Transmission |
| Functional Configuration | External energy adjustment, 2D motorized slit |
| Optional | Spatial Light Modulator (SLM), auto-focus tracking |
| Adjustment Stage | Manual |
| Travel Range of Motion Stage | 200 mm × 200 mm |
| Fixture & Workstation | Large-area transparent adsorption stage |
Hot
Femtosecond Laser Micro-Nano Automatic Processing Equipment for Fiber Bragg Gratings SA-FSD-1000IR
SKU:
SA-FSD-1000IR
In stock
Login to see prices| Processing Position | Mass production of typical fiber gratings Kilometer-length fiber processing |
|---|---|
| Wavelength | 515nm |
| Objective Lens | 60× |
| Illumination | Transmission |
| Functional Configuration | External energy adjustment |
| Optional | Spatial Light Modulator (SLM), 2D motorized slit |
| Adjustment Stage | Motorized |
| Travel Range of Motion Stage | 100 mm × 100 mm |
| Fixture & Workstation | Automatic fixture for fiber grating fabrication |
| Automatic fiber winding | Full-function automatic fiber winding |