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- Saura (28)
Fabrication
Chain Magnetron Sputter System SA-VKI2000
SKU:
SA-VKI2000
Rated 0 out of 5
In stock
Call for Price| Number of Cathodes(max.) | 2 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Ion Source | Anode & Kaufman & RF ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | ±3% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | 1000āÆmmĆ1000āÆmm |
| Ultimate Vacuum | 3E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + āCapacitance diaphragm gauge |
| Temperature Range | RT~300ā |
| Size(LĆWĆH) | 5mĆ2.8mĆ1.6m |
Dielectric Etcher SA-NMC508SDH/SDL
SKU:
SA-NMC508SDH/SDL
Rated 0 out of 5
In stock
Call for Price| Wafer Size | 6″, 8″ |
|---|---|
| Etching Materials | Dielectric SiNx, Dielectric SiON, Dielectric SiO2 |
| Processes | FEOL/BEOL(HM/CT/Spacer/Via/PAD) |
| SHD | Si(SDH), Al-Y2O3 coating(SDL) |
| Gas Injection | Dual zone inject(10-90% adj) |
| Temp Control | Chiller |
| Cathode | Dual zone ESC |
| Process Mode | Clean Mode(SDL) |
| Etch Rate(ER) | > 4500 A/min(SDH), >6000 A/min(SDL) |
| Sidewall Roughness | < 1 nm(SDH) |
| U% | WIW < 3% @ EE3mm, WTW < 3% |
| WPH | ~ 10 @15K(SDH), 12 @10K(SDL) |
| COC | 1 |
| MTTR | <1h(SDH) |
| MTBC | > 200 RFh(SDH), > 150 RFh(SDL) |
| Size(LĆWĆH) | 3279mmĆ3253mmĆ2339mm |
Electron Beam Evaporation System SA-VKE1100/E1500
SKU:
SA-VKE1100/E1500
Rated 0 out of 5
In stock
Call for Price| Number of Crucibles(max.) | 8 |
|---|---|
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | RF & Kaufman & Hall ion source |
| Fixture types | Dome & Knudsen & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ć300āÆmm |
| Ultimate Vacuum | 2E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~300ā |
| Size(LĆWĆH) | 4.05mĆ3.9mĆ2.8m |
Electron Beam Evaporation System SA-VKE1100D/E1500D
SKU:
SA-VKE1100D/E1500D
Rated 0 out of 5
In stock
Call for Price| Number of Crucibles(max.) | 4 |
|---|---|
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | RF & Kaufman & Hall ion source |
| Fixture types | Dome & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ć960āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~300ā |
| Size(LĆWĆH) | 4.4mĆ4.1mĆ2.6m |
Electron Beam Evaporation System SA-VKE1500Pro
SKU:
SA-VKE1500Pro
Rated 0 out of 5
In stock
Call for Price| Number of Crucibles(max.) | 8 |
|---|---|
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | RF & Kaufman & Hall ion source |
| Fixture types | Dome & Knudsen & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | 12ĆĆ200āÆmm |
| Ultimate Vacuum | 2E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~200ā |
| Size(LĆWĆH) | 8.5mĆ5.5mĆ3.3m |
Electron Beam Evaporation System SA-VKE360
SKU:
SA-VKE360
Rated 0 out of 5
In stock
Call for Price| Number of Crucibles(max.) | 6 |
|---|---|
| Power Supply(max.) | 10kW |
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45°~45°ļ¼adjustable |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Hall ion source |
| Fixture types | Dome & Plate |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±3% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ć200āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | -50~300ā |
| Size(LĆWĆH) | 3.15mĆ2.4mĆ2.2m |
Electron Beam Evaporation System SA-VKE500D
SKU:
SA-VKE500D
Rated 0 out of 5
In stock
Call for Price| Number of Crucibles(max.) | 6 |
|---|---|
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45°~45°ļ¼adjustable |
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Kaufman & Hall ion source |
| Fixture types | Dome &Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ć260āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~500ā |
| Size(LĆWĆH) | 3mĆ2.5mĆ2.2m |
Electron Beam Evaporation System SA-VKE550/E800
SKU:
SA-VKE500/E800
Rated 0 out of 5
In stock
Call for Price| Number of Crucibles(max.) | 8 |
|---|---|
| Power Supply(max.) | 10kW |
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | RF & Kaufman & Hall ion source |
| Fixture types | Dome & Knudsen & Planetary &Plate |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±3% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ć300āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~300ā |
| Size(LĆWĆH) | 3.35mĆ2.8mĆ2.2m |
Electron Beam Evaporation System SA-VKE800D
SKU:
SA-VKE800D
Rated 0 out of 5
In stock
Call for Price| Number of Crucibles(max.) | 6 |
|---|---|
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45°~45°ļ¼adjustable |
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Kaufman & Hall ion source |
| Fixture types | Dome & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ć300āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~500ā |
| Size(LĆWĆH) | 4.0mĆ3.1mĆ2.9m |
Femtosecond Laser 3D Micro-Nano Processing Equipment for Hard-and-Brittle Materials SA-FSD-500
SKU:
SA-FSD-500
Rated 0 out of 5
In stock
Call for Price| Processing Position | Patterned material modification and waveguide structures |
|---|---|
| Wavelength | 1030nm, 515nm |
| Objective Lens | 50Ć/20Ć |
| Illumination | Reflection & Transmission |
| Functional Configuration | External energy adjustment, 2D motorized slit |
| Optional | Spatial Light Modulator (SLM), auto-focus tracking |
| Adjustment Stage | Manual |
| Travel Range of Motion Stage | 200āÆmm Ć 200āÆmm |
| Fixture & Workstation | Large-area transparent adsorption stage |
Femtosecond Laser Micro-Nano Automatic Processing Equipment for Fiber Bragg Gratings SA-FSD-1000IR
SKU:
SA-FSD-1000IR
Rated 0 out of 5
In stock
Call for Price| Processing Position | Mass production of typical fiber gratings Kilometer-length fiber processing |
|---|---|
| Wavelength | 515nm |
| Objective Lens | 60Ć |
| Illumination | Transmission |
| Functional Configuration | External energy adjustment |
| Optional | Spatial Light Modulator (SLM), 2D motorized slit |
| Adjustment Stage | Motorized |
| Travel Range of Motion Stage | 100āÆmm Ć 100āÆmm |
| Fixture & Workstation | Automatic fixture for fiber grating fabrication |
| Automatic fiber winding | Full-function automatic fiber winding |
Femtosecond Laser Micro-Nano Multi-Functional Processing Equipment for Fiber Bragg Gratings SA-FSD-1000M
SKU:
SA-FSD-1000M
Rated 0 out of 5
In stock
Call for Price| Processing Position | Various fiber grating types |
|---|---|
| Wavelength | 515nm, 1030nm |
| Objective Lens | 60Ć/20Ć |
| Illumination | Reflection & Transmission |
| Functional Configuration | External energy adjustment, 2D motorized slit |
| Optional | Spatial Light Modulator (SLM), galvanometer scanner |
| Adjustment Stage | Motorized |
| Travel Range of Motion Stage | 100āÆmm Ć 100āÆmm |
| Fixture & Workstation | Fiber rotary fixture, oil reservoir, processing station for sheetāshaped materials |
| Automatic fiber winding | Partial-function automatic fiber winding |