Metal Etcher SA-NMC508SEM

SKU: SA-NMC508SEM

SA-NMC508SEM is a mass-production proven 6/8-inch metal etcher targeting logic, Si/SiC/GaN power and MEMS devices. It etches AlCu, W, TiN and related alloys for TM, IM and WEB processes. Equipped with dual coils and fully-automatic RF matching, it features 1600L/s high-flow pump and 350RFh long MTBC, ensuring superior etching uniformity, high throughput and low operation cost.

Login to see prices

(Price on request)

Email: sales@saurasemi.com

Compare

Description

Datasheet

SA-NMC508SEM is a mass-production proven 6/8-inch metal etcher targeting logic, Si/SiC/GaN power and MEMS devices. It etches AlCu, W, TiN and related alloys for TM, IM and WEB processes. Equipped with dual coils and fully-automatic RF matching, it features 1600L/s high-flow pump and 350RFh long MTBC, ensuring superior etching uniformity, high throughput and low operation cost.

Feature	Application
Improve Etch U% Comparable High Etch Rate Better PA Control Better CoO & CoC	Logic Power SiC MEMS GaN

Principle：

Specification

Features

Wafer Size	6″, 8″

General

Etching Materials	AlCu, AlSiCu, Ti, TiN, TiW, W
Processes	TM/IM/WEB
Coil	Dual Coil
Match Mode	Fully automatic matching
Upper frequency	13.56MHz
Window Heating	Heater Heating
Chamber Heating	Chiller
Pump	1600L/s
N2 Pressure Control	Y
Throughput	6K/M
MTBC	350RFh
Size(L×W×H)or(D×W×H)	3250mm×2580mm×2397mm

Customer Reviews

Rated 0 out of 5

0 reviews

Rated 5 out of 5

0

Rated 4 out of 5

0

Rated 3 out of 5

0

Rated 2 out of 5

0

Rated 1 out of 5

0

Reviews

Clear filters

There are no reviews yet.

Be the first to review “Metal Etcher SA-NMC508SEM”

Your email address will not be published. Required fields are marked *

Your rating *

Value for money

1 2 3 4 5

Durability

1 2 3 4 5

Delivery speed

1 2 3 4 5

Your review *

Pros

Cons

Name *

Email *

Related Products

Electron Beam Evaporation System SA-VKE1100/E1500

PVD, Electron Beam Evaporation System, Fabrication

Rated 0 out of 5

In stock

SKU: SA-VKE1100/E1500

Number of Crucibles(max.)	8
Power Supply(max.)	10kW
Film thickness monitoring	Crystal oscillator controller
Ion Source	RF & Kaufman & Hall ion source
Fixture types	Dome & Knudsen & Planetary
Pumping System	Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Coating Uniformity	±2%
Coating Repeatability	±2%
Uniform Deposition Area(max.)	Ø300 mm
Ultimate Vacuum	2E-5Pa
Vacuum Measurement	Full-range vacuum gauge
Temperature Range	RT~300℃
Size(L×W×H)or(D×W×H)	4.05m×3.9m×2.8m

Electron Beam Evaporation System SA-VKE800D

PVD, Electron Beam Evaporation System, Fabrication

Rated 0 out of 5

In stock

SKU: SA-VKE800D

Number of Crucibles(max.)	6
Automatic Loadlocks	Single &multi-chip automatic laodlock
Workpiece Angle	-45°~45°，adjustable
Power Supply(max.)	10kW
Film thickness monitoring	Crystal oscillator controller
Ion Source	Kaufman & Hall ion source
Fixture types	Dome & Planetary
Pumping System	Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Coating Uniformity	±2%
Coating Repeatability	±2%
Uniform Deposition Area(max.)	Ø300 mm
Ultimate Vacuum	1E-5Pa
Vacuum Measurement	Full-range vacuum gauge
Temperature Range	RT~500℃
Size(L×W×H)or(D×W×H)	4.0m×3.1m×2.9m

Fully automatic slot developing manchine SA-SDM-48LS

Fabrication, Developing Machines

Rated 0 out of 5

In stock

SKU: SA-SDM-48LS

Wafer Size	4″~6″
Cleaning Capacity	25pieces2baskets or 4baskets/batch

Magnetron Sputter System SA-VKM360

PVD, Magnetron Sputter System, Fabrication

Rated 0 out of 5

In stock

SKU: SA-VKM360

Number of Cathodes(max.)	4
Sputtering Power Supply	DC / RF / pulsed DC, freely switchable
Ion Source	RF & Kaufman & Hall ion source
Bias	RF / pulsed DC
Vacuum Sampling Chamber	optional
Pumping System	Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow Control	Digital mass flow meter
Coating Uniformity	±3%
Coating Repeatability	±2%
Uniform Deposition Area(max.)	Ø150 mm
Vacuum Measurement	Full-range vacuum gauge + ‌Capacitance diaphragm gauge
Ultimate Vacuum	1E-5Pa
Temperature Range	RT~300℃
Size(L×W×H)or(D×W×H)	1.6m×2.75m×1.8m

Hot

Multi-chamber Intergated System SA-VKC600

PVD, General PVD, Fabrication

Rated 0 out of 5

In stock

SKU: SA-VKC600

Process Chamber Type	Sputter & Degas & Pre-clean & Evaporation
Autosampling Chamber	Integrated with BROOKS system
Ion Source	optional
Pumping System	Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow Control	Digital mass flow meter
Coating Uniformity	±2%
Coating Repeatability	±2%
Uniform Deposition Area(max.)	Ø200 mm
Ultimate Vacuum	1E-5Pa
Vacuum Measurement	Full-range vacuum gauge + ‌Capacitance diaphragm gauge
Temperature Range	-80~500℃
Size(L×W×H)or(D×W×H)	3.73m×2.75m×2.2m

SiC Etcher SA-GDE C200L

Fabrication, Etchers, SiC Etchers

Rated 0 out of 5

In stock

SKU: SA-GDE C200L

Wafer Size	6″, 8″
Etching Materials	AlScN, Polymer, SiC, SiN, SiO2
Processes	SiC trench/SiC Via/Sic Mark
SRF Frequency	2MHz
SRF Power	2500W
SRF Coil	ICP Cubic
BRF Frequency	13.56MHz
BRF Power	1500W
Wall	RT~80℃(Adjustable)
Upper Electrode	RT~120℃(Adjustable)
Bottom Electrode	Clamp chuck:-20~300℃(Max400℃),E chuck:-20~90℃
Wafer Clampage	ESC/Mechanical damp
Turbo Pump	BOC,2650L/s
Injection	TOP,Center
MFC	8 gas/12 gas
EPD	OES/LEP&CCD
Surface Treatment	Roughness coating
Open Method	Electrical

24 Support

Worldwide

Shipping

Metal Etcher SA-NMC508SEM

Description

Specification

Features

General

Customer Reviews

Reviews

Related Products

Electron Beam Evaporation System SA-VKE1100/E1500

Electron Beam Evaporation System SA-VKE800D

Fully automatic slot developing manchine SA-SDM-48LS

Magnetron Sputter System SA-VKM360

Multi-chamber Intergated System SA-VKC600

SiC Etcher SA-GDE C200L