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Electron Beam Evaporation System SA-VKE1100/E1500

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SKU: SA-VKE1100/E1500

SA-VKE1100 and SA-VKE1500 are mass-production electron beam evaporation platforms. Equipped with a wide uniform coating region, they deliver consistent stable operation, complete automated control and low maintenance costs, perfectly catering to high-throughput evaporation processes for oversized substrates and workpieces.

Feature

Low cost
Lift-off
Co-deposition
High evaporation rate

Application

Laser
R&D
Intergated circuit
MEMS

Specifications：

Parameter	Descriptions
Number of Crucibles	8(max.)
Power Supply	10kW(max.)
Film thickness monitoring	Crystal oscillator controller
Ion Source	RF & Kaufman & Hall ion source
Fixture types	Dome & Knudsen & Planetary
Pumping System	Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Coating Uniformity	±2%
Coating Repeatability	±2%
Uniform Deposition Area	Ø300 mm(max.)
Ultimate Vacuum	2E-5Pa
Vacuum Measurement	Full-range vacuum gauge + ‌Capacitance diaphragm gauge
Temperature Control Range	RT~300℃
Space Requirements(L×W×H,m)	4.05×3.9×2.8

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(Price on request)

Email: sales@saurasemi.com

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Description

Datasheet

SA-VKE1100 and SA-VKE1500 are mass-production electron beam evaporation platforms. Equipped with a wide uniform coating region, they deliver consistent stable operation, complete automated control and low maintenance costs, perfectly catering to high-throughput evaporation processes for oversized substrates and workpieces.

Feature	Application
Low cost Lift-off Co-deposition High evaporation rate	Laser R&D Intergated circuit MEMS

Principle：

Specification

Features

Number of Crucibles(max.)	8
Uniform Deposition Area(max.)	Ø300 mm
Ultimate Vacuum	2E-5Pa

General

Power Supply(max.)	10kW
Film thickness monitoring	Crystal oscillator controller
Ion Source	RF & Kaufman & Hall ion source
Fixture types	Dome & Knudsen & Planetary
Pumping System	Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Coating Uniformity	±2%
Coating Repeatability	±2%
Vacuum Measurement	Full-range vacuum gauge
Temperature Range	RT~300℃
Size(L×W×H)	4.05m×3.9m×2.8m

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Number of Cathodes(max.)	2
Sputtering Power Supply	DC / RF / pulsed DC, freely switchable
Ion Source	Anode & Kaufman & RF ion source
Bias	RF / pulsed DC
Vacuum Sampling Chamber	Fully-automatic sampling chamber, optional
Pumping System	Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow Control	Digital mass flow meter
Coating Uniformity	±3%
Coating Repeatability	±2%
Uniform Deposition Area(max.)	1000 mm×1000 mm
Ultimate Vacuum	3E-5Pa
Vacuum Measurement	Full-range vacuum gauge + ‌Capacitance diaphragm gauge
Temperature Range	RT~300℃
Size(L×W×H)	5m×2.8m×1.6m

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Etching Materials	Dielectric SiO2, Dielectric SiNx, Dielectric SiON
Processes	FEOL/BEOL(HM/CT/Spacer/Via/PAD)
SHD	Si(SDH), Al-Y2O3 coating(SDL)
Gas Injection	Dual zone inject(10-90% adj)
Temp Control	Chiller
Cathode	Dual zone ESC
Process Mode	Clean Mode(SDL)
Etch Rate(ER)	> 4500 A/min(SDH), >6000 A/min(SDL)
Sidewall Roughness	< 1 nm(SDH)
U%	WIW < 3% @ EE3mm, WTW < 3%
WPH	~ 10 @15K(SDH), 12 @10K(SDL)
COC	1
MTTR	<1h(SDH)
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Number of Crucibles(max.)	6
Power Supply(max.)	10kW
Automatic Loadlocks	Single &multi-chip automatic laodlock
Workpiece Angle	-45°~45°，adjustable
Film thickness monitoring	Crystal oscillator controller
Ion Source	Hall ion source
Fixture types	Dome & Plate
Pumping System	Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Coating Uniformity	±3%
Coating Repeatability	±2%
Uniform Deposition Area(max.)	Ø200 mm
Ultimate Vacuum	1E-5Pa
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Number of Process Chambers(max.)	5
Process Chamber Type	Sputter & Degas & Pre-clean & Evaporation
Number of Sample Chambers(max.)	2
Autosampling Chamber	Integrated with BROOKS system
Ion Source	optional
Pumping System	Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow Control	Digital mass flow meter
Coating Uniformity	±2%
Coating Repeatability	±2%
Uniform Deposition Area(max.)	Ø200 mm
Ultimate Vacuum	1E-5Pa
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Power Supply(max.)	8kW
Automatic Loadlocks	Single &multi-chip automatic laodlock
Workpiece Angle	-45°~45°，adjustable
Film thickness monitoring	Crystal oscillator controller
Ion Source	Hall ion source
Fixture types	Dome & Knudsen & Plate
Pumping System	Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
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Coating Repeatability	±2%
Uniform Deposition Area(max.)	Ø200 mm
Ultimate Vacuum	1E-5Pa
Vacuum Measurement	Full-range vacuum gauge
Temperature Range	-50~500℃
Size(L×W×H)	3.15m×2.4m×2.2m

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Electron Beam Evaporation System SA-VKE1100/E1500

Description

Specification

Features

General

Customer Reviews

Reviews

Related Products

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HK office

HK office

HK office

HK office