Showing 1–12 of 18 results

PVD Systems deliver high-quality thin-film deposition through physical vapor deposition processes. With stable film uniformity and versatile material compatibility, they support precise coating applications across optoelectronic and semiconductor device manufacturing.

PVD

Chain Magnetron Sputter System SA-VKI2000

SKU: SA-VKI2000

In stock

Number of Cathodes(max.)2
Sputtering Power SupplyDC / RF / pulsed DC, freely switchable
Ion SourceAnode & Kaufman & RF ion source
BiasRF / pulsed DC
Vacuum Sampling ChamberFully-automatic sampling chamber, optional
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow ControlDigital mass flow meter
Coating Uniformity±3%
Coating Repeatability±2%
Uniform Deposition Area(max.)1000 mm×1000 mm
Ultimate Vacuum3E-5Pa
Vacuum MeasurementFull-range vacuum gauge + ‌Capacitance diaphragm gauge
Temperature RangeRT~300℃
Size(L×W×H)or(D×W×H)5m×2.8m×1.6m

Electron Beam Evaporation System SA-VKE1100/E1500

SKU: SA-VKE1100/E1500

In stock

Number of Crucibles(max.)8
Power Supply(max.)10kW
Film thickness monitoringCrystal oscillator controller
Ion SourceRF & Kaufman & Hall ion source
Fixture typesDome & Knudsen & Planetary
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Coating Uniformity±2%
Coating Repeatability±2%
Uniform Deposition Area(max.)Ø300 mm
Ultimate Vacuum2E-5Pa
Vacuum MeasurementFull-range vacuum gauge
Temperature RangeRT~300℃
Size(L×W×H)or(D×W×H)4.05m×3.9m×2.8m

Electron Beam Evaporation System SA-VKE1100D/E1500D

SKU: SA-VKE1100D/E1500D

In stock

Number of Crucibles(max.)4
Power Supply(max.)10kW
Film thickness monitoringCrystal oscillator controller
Ion SourceRF & Kaufman & Hall ion source
Fixture typesDome & Planetary
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Coating Uniformity±2%
Coating Repeatability±2%
Uniform Deposition Area(max.)Ø960 mm
Ultimate Vacuum1E-5Pa
Vacuum MeasurementFull-range vacuum gauge
Temperature RangeRT~300℃
Size(L×W×H)or(D×W×H)4.4m×4.1m×2.6m

Electron Beam Evaporation System SA-VKE1500Pro

SKU: SA-VKE1500Pro

In stock

Number of Crucibles(max.)8
Power Supply(max.)10kW
Film thickness monitoringCrystal oscillator controller
Ion SourceRF & Kaufman & Hall ion source
Fixture typesDome & Knudsen & Planetary
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Coating Uniformity±2%
Coating Repeatability±2%
Uniform Deposition Area(max.)12ר200 mm
Ultimate Vacuum2E-5Pa
Vacuum MeasurementFull-range vacuum gauge
Temperature RangeRT~200℃
Size(L×W×H)or(D×W×H)8.5m×5.5m×3.3m

Electron Beam Evaporation System SA-VKE360

SKU: SA-VKE360

In stock

Number of Crucibles(max.)6
Power Supply(max.)10kW
Automatic LoadlocksSingle &multi-chip automatic laodlock
Workpiece Angle-45°~45°,adjustable
Film thickness monitoringCrystal oscillator controller
Ion SourceHall ion source
Fixture typesDome & Plate
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Coating Uniformity±3%
Coating Repeatability±2%
Uniform Deposition Area(max.)Ø200 mm
Ultimate Vacuum1E-5Pa
Vacuum MeasurementFull-range vacuum gauge
Temperature Range-50~300℃
Size(L×W×H)or(D×W×H)3.15m×2.4m×2.2m

Electron Beam Evaporation System SA-VKE500D

SKU: SA-VKE500D

In stock

Number of Crucibles(max.)6
Automatic LoadlocksSingle &multi-chip automatic laodlock
Workpiece Angle-45°~45°,adjustable
Power Supply(max.)10kW
Film thickness monitoringCrystal oscillator controller
Ion SourceKaufman & Hall ion source
Fixture typesDome &Planetary
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Coating Uniformity±2%
Coating Repeatability±2%
Uniform Deposition Area(max.)Ø260 mm
Ultimate Vacuum1E-5Pa
Vacuum MeasurementFull-range vacuum gauge
Temperature RangeRT~500℃
Size(L×W×H)or(D×W×H)3m×2.5m×2.2m

Electron Beam Evaporation System SA-VKE550/E800

SKU: SA-VKE500/E800

In stock

Number of Crucibles(max.)8
Power Supply(max.)10kW
Automatic LoadlocksSingle &multi-chip automatic laodlock
Film thickness monitoringCrystal oscillator controller
Ion SourceRF & Kaufman & Hall ion source
Fixture typesDome & Knudsen & Planetary &Plate
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Coating Uniformity±3%
Coating Repeatability±2%
Uniform Deposition Area(max.)Ø300 mm
Ultimate Vacuum1E-5Pa
Vacuum MeasurementFull-range vacuum gauge
Temperature RangeRT~300℃
Size(L×W×H)or(D×W×H)3.35m×2.8m×2.2m

Electron Beam Evaporation System SA-VKE800D

SKU: SA-VKE800D

In stock

Number of Crucibles(max.)6
Automatic LoadlocksSingle &multi-chip automatic laodlock
Workpiece Angle-45°~45°,adjustable
Power Supply(max.)10kW
Film thickness monitoringCrystal oscillator controller
Ion SourceKaufman & Hall ion source
Fixture typesDome & Planetary
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Coating Uniformity±2%
Coating Repeatability±2%
Uniform Deposition Area(max.)Ø300 mm
Ultimate Vacuum1E-5Pa
Vacuum MeasurementFull-range vacuum gauge
Temperature RangeRT~500℃
Size(L×W×H)or(D×W×H)4.0m×3.1m×2.9m

General PVD System SA-eVictor AX20P

SKU: SA-eVictor AX20P

In stock

Wafer Size6″, 8″
THK mean(A)1000±50(Ni), 600±30(Ti), 1000±50(TiN), 40K±2K(Al)
Rs Mean(Ω/□)1±0.02(Ni), 11±1.0(Ti), 16±3.0(TiN), 0.75±0.05(Al)
Rs U%(WIW,%,16)< 3%
Infilm Particle< 30ea@0.3μm
Size(L×W×H)or(D×W×H)2700mm×3200mm×2200mm, 4400mm×3100mm×2200mm

General PVD System SA-Polaris BM620

SKU: SA-Polaris BM620

In stock

Wafer Size6″, 8″
THK mean(A)1500±75(Ni), 2000±100(Ti), 10K±500(Ag)
Rs Mean(Ω/□)0.6±0.1(Ni), 2.9±0.3(Ti), 0.021±0.005(Ag)
Rs U%(WIW,%,16)< 3@EE3
Infilm Particle< 30ea@0.3μm
Size(L×W×H)or(D×W×H)2700mm×3200mm×2200mm, 4400mm×3100mm×2200mm

Indium Evaporation System SA-VKT550I

SKU: SA-VKT550I

In stock

Power Supply(max.)8kW
Workpiece Angle-45°~45°,adjustable
Film thickness monitoringCrystal oscillator controller
Ion SourceKaufman & Hall ion source
Fixture typesDome & Knudsen & Plate
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Coating Uniformity±3%
Coating Repeatability±2%
Uniform Deposition Area(max.)Ø300 mm
Ultimate Vacuum1E-5Pa
Vacuum MeasurementFull-range vacuum gauge
Temperature Range-80~200℃
Size(L×W×H)or(D×W×H)3.3m×2.7m×2.2m

Magnetron Sputter System SA-VKM360

SKU: SA-VKM360

In stock

Number of Cathodes(max.)4
Sputtering Power SupplyDC / RF / pulsed DC, freely switchable
Ion SourceRF & Kaufman & Hall ion source
BiasRF / pulsed DC
Vacuum Sampling Chamberoptional
Pumping SystemCryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump
Flow ControlDigital mass flow meter
Coating Uniformity±3%
Coating Repeatability±2%
Uniform Deposition Area(max.)Ø150 mm
Vacuum MeasurementFull-range vacuum gauge + ‌Capacitance diaphragm gauge
Ultimate Vacuum1E-5Pa
Temperature RangeRT~300℃
Size(L×W×H)or(D×W×H)1.6m×2.75m×1.8m