Showing 13–24 of 48 results
Electron Beam Evaporation System SA-VKE550/E800
SKU:
SA-VKE500/E800
In stock
Call for Price| Number of Crucibles(max.) | 8 |
|---|---|
| Power Supply(max.) | 10kW |
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | RF & Kaufman & Hall ion source |
| Fixture types | Dome & Knudsen & Planetary &Plate |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | Ā±3% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć300āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~300ā |
| Size(LĆWĆH) | 3.35mĆ2.8mĆ2.2m |
Electron Beam Evaporation System SA-VKE800D
SKU:
SA-VKE800D
In stock
Call for Price| Number of Crucibles(max.) | 6 |
|---|---|
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45Ā°~45Ā°ļ¼adjustable |
| Power Supply(max.) | 10kW |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Kaufman & Hall ion source |
| Fixture types | Dome & Planetary |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | Ā±2% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć300āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | RT~500ā |
| Size(LĆWĆH) | 4.0mĆ3.1mĆ2.9m |
Hot
Femtosecond Laser 3D Micro-Nano Processing Equipment for Hard-and-Brittle Materials SA-FSD-500
SKU:
SA-FSD-500
In stock
Call for Price| Processing Position | Patterned material modification and waveguide structures |
|---|---|
| Wavelength | 1030nm, 515nm |
| Objective Lens | 50Ć/20Ć |
| Illumination | Reflection & Transmission |
| Functional Configuration | External energy adjustment, 2D motorized slit |
| Optional | Spatial Light Modulator (SLM), auto-focus tracking |
| Adjustment Stage | Manual |
| Travel Range of Motion Stage | 200āÆmm Ć 200āÆmm |
| Fixture & Workstation | Large-area transparent adsorption stage |
Hot
Femtosecond Laser Micro-Nano Automatic Processing Equipment for Fiber Bragg Gratings SA-FSD-1000IR
SKU:
SA-FSD-1000IR
In stock
Call for Price| Processing Position | Mass production of typical fiber gratings Kilometer-length fiber processing |
|---|---|
| Wavelength | 515nm |
| Objective Lens | 60Ć |
| Illumination | Transmission |
| Functional Configuration | External energy adjustment |
| Optional | Spatial Light Modulator (SLM), 2D motorized slit |
| Adjustment Stage | Motorized |
| Travel Range of Motion Stage | 100āÆmm Ć 100āÆmm |
| Fixture & Workstation | Automatic fixture for fiber grating fabrication |
| Automatic fiber winding | Full-function automatic fiber winding |
Femtosecond Laser Micro-Nano Multi-Functional Processing Equipment for Fiber Bragg Gratings SA-FSD-1000M
SKU:
SA-FSD-1000M
In stock
Call for Price| Processing Position | Various fiber grating types |
|---|---|
| Wavelength | 1030nm, 515nm |
| Objective Lens | 60Ć/20Ć |
| Illumination | Reflection & Transmission |
| Functional Configuration | External energy adjustment, 2D motorized slit |
| Optional | Spatial Light Modulator (SLM), galvanometer scanner |
| Adjustment Stage | Motorized |
| Travel Range of Motion Stage | 100āÆmm Ć 100āÆmm |
| Fixture & Workstation | Fiber rotary fixture, oil reservoir, processing station for sheetāshaped materials |
| Automatic fiber winding | Partial-function automatic fiber winding |
Hot
Fully automated, high-performance PECVD equipment SA-EPEE i200
SKU:
SA-EPEE i200
In stock
Call for Price| Wafer Size | 6″, 8″ |
|---|---|
| Substrate Type | Si, SiC, W, TiN, Ti, TiW |
| Standard Configuration | SMIFĆ3+EFEMĆ1+LLĆ2+TMĆ1+PMĆ3 |
| Wafer Station | Twins chamber, 2 pcs/chamber, max 6pcs for 3 chambers |
| Automation | Open cassette/SMIF |
| Process | SiO2/SiNx/TEOS/BPSG |
| Deposit Materials | SiNx, SiON, TEOS SiO2, BPSG, SiO2 |
| Uniformity | WIW ā¤3.0%ćWTWā¤3.0%ćRTRā¤3.0% |
| Gas Configuration | TEOS/TEPO/TEB/O2/SiH4/NH3/N2O/He/N2/NF3/Ar(RPS) |
| Cooling Module | EFFM cooling buffer |
| Foot print | 2100Ć3360(7.0m2) |
| WPH(relative) | 1.20 |
| CoC(relative) | 0.83 |
| CoO(relative) | 0.75 |
| Clean Mode | RPS clean,>2Ī¼m/min |
| Size(LĆWĆH) | 2100mmĆ3360mmĆ2600mm |
Fully automatic after gringing cleaning manchine SA-AGCM-48LS
SKU:
SA-AGCM-48LS
In stock
Call for Price| Wafer Size | 4″~8″ |
|---|---|
| Cleaning Capacity | 25pieces2baskets/batch |
| Control Part | PLC and HMI |
Fully automatic cassette cleaning manchine SA-CCM-48LS
SKU:
SA-CCM-48LS
In stock
Call for Price| Wafer Size | 6″, 8″ |
|---|---|
| Cleaning Capacity | cassete:8pieces/batch, basket:16pieces/batch |
| Up Time | ā„98% |
| MTTR | <2hrs |
| MTBF | ā„400hrs |
| Control Part | PLC and HMI |
Fully automatic de-edge cleaning manchine SA-DECM-48LS
SKU:
SA-DECM-48LS
In stock
Call for Price| Wafer Size | 6″~8″ |
|---|---|
| Edge Triming Accuracy | Ā±0.1mm |
| Control Part | PLC and HMI |
| Gas Projection | CDA/N2 |
Fully automatic final cleaning manchine SA-FCM-48LS
SKU:
SA-FCM-48LS
In stock
Call for Price| Wafer Size | 6″, 8″ |
|---|---|
| Processing Capacity | 50 wafers /tank time |
| Solution Temperature | 50ā~80āĀ±1ā |
| Megasonic Cleaning | 950KHz,400W |
| Solution Accuracy Error | ā¤ 1% |
| Metal Ions | ā¤ 5E10 atoms/cm2 |
| Particle Control | ā¤ 10 pieces/wafer@0.3Ī¼m, ā¤ 20 pieces/wafer@0.2Ī¼m |
| Production Efficiency | ā„ 275 wafers/hour |
Fully automatic furnace tube cleaning manchine SA-FTCM-48LS
SKU:
SA-FTCM-48LS
In stock
Call for Price| Tube Size | Ī¦450mm |
|---|---|
| Control Part | PLC and HMI |
| Gas Projection | CDA/N2 |
Fully automatic Nickel and Gold Plating Cleaning Machine SA-NAGP-48LS
SKU:
SA-NAGP-48LS
In stock
Call for Price| Temperature Control Accuracy | Ā±1ā |
|---|---|
| Control Part | PLC and HMI |