Showing 37–48 of 55 results
Magnetron Sputter System SA-VKM600/M700
In stock
SKU:
SA-VKM600/M700
| Number of Cathodes(max.) | 5 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Single-wafer / multi-wafer fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø300 mm |
| Ultimate Vacuum | 8E-6Pa |
| Vacuum Measurement | Full-range vacuum gauge + Capacitance diaphragm gauge |
| Temperature Range | -50~800℃ |
| Size(L×W×H)or(D×W×H) | 3.2m×3.3m×2.2m |
Magnetron Sputter System SA-VKM800
In stock
SKU:
SA-VKM800
| Number of Cathodes(max.) | 4 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Ion Source | RF & Kaufman & Hall ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Multi-wafer fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | ±1.5% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | 5×Ø300 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + Capacitance diaphragm gauge |
| Temperature Range | -50~800℃ |
| Size(L×W×H)or(D×W×H) | 3.2m×3.3m×2.2m |
Multi-chamber Cluster Magnetron Sputter System SA-VKC500
In stock
SKU:
SA-VKC500
| Process Chamber Type | Sputter & Degas & Pre-clean |
|---|---|
| Autosampling Chamber | Integrated with BROOKS system |
| Ion Source | DC/RF ion source, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Etching Area(max.) | Ø200 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + Capacitance diaphragm gauge |
| Temperature Range | -50~500℃ |
| Size(L×W×H)or(D×W×H) | 3.73m×2.75m×2.2m |
Hot
Multi-chamber Intergated System SA-VKC600
In stock
SKU:
SA-VKC600
| Process Chamber Type | Sputter & Degas & Pre-clean & Evaporation |
|---|---|
| Autosampling Chamber | Integrated with BROOKS system |
| Ion Source | optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø200 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + Capacitance diaphragm gauge |
| Temperature Range | -80~500℃ |
| Size(L×W×H)or(D×W×H) | 3.73m×2.75m×2.2m |
Hot
Multi-Photon 3D Laser Direct-Write Lithography System SA-MPD series
In stock
SKU:
SA-MPD series
| Wavelength | 515nm, 780nm |
|---|---|
| Lateral Minimum Feature Size Limit | 40 nm |
| Lateral Minimum Pitch Limit | 150 nm |
| Lateral Minimum Feature Size | XY ≤ 80 nm(MPD-100、MPD-1000), XY ≤ 50 nm(MPD-2000) |
| Lateral Minimum Pitch / Resolution | XY ≤ 300 nm(MPD-100、MPD-1000), XY ≤ 200 nm(MPD-2000) |
| Stitching Accuracy | ≤ 200 nm |
| Optimal Surface Roughness | ≤ 5 nm |
| High-Precision Auto-Focusing | Accuracy ≤25nm, compatible with both transparent and opaque substrates including silicon, glass, and sapphire |
| Focusing System | Standard: Total magnification 66×, NA 1.42(Other magnifications and specifications available upon request) |
| Power Supply | Power cable: 6 mm2 cross-section 220V AC, 50 Hz, 16 A |
| Peak Power / Operating Power | 4 kW/1 kW(MPD-100), 8 kW/4 kW(MPD-1000、MPD-2000) |
| Recommended Usage Area | 2 m×2 m |
| Size(L×W×H)or(D×W×H) | 1300mm×1300mm×2200mm, 940mm×785mm×720mm |
| Cabinet Dimensions(mm, W×D×H) | 620×800×160 |
| Weight | <1200kg, <600kg |
| Intelligent Strategies | 1.Contour/Shell Filling; 2.Arbitrary/Custom Sequence Mode; 3.Adaptive Slicing; 4.Vector Mode |
| Fixture/Substrate | 1.Including but not limited to metal, glass (quartz), sapphire, silicon wafers; 2.Compatible with multiple substrate fixturing methods: vacuum chucking, mechanical clamping, magnetic chucking; 3.Standard/Custom optical fiber fixtures |
| More Functions | Anchor points, Measurement, Fiducial marking, Tilt compensation, Rotation, etc. |
| Photoresist/Materials | 1.Self-developed two-photon photoresists, HBP, PPI-Dip, HBO-2, etc.; 2.Compatible with third-party two-photon photoresists and other photocurable materials, including but not limited to AZ series, SU-8 series; 3.Supports printing of biocompatible hydrogel materials; 4.Supports precursor photoresists for glass, PDMS and other functional materials |
| Average power | ≥ 1W |
| Pulse duration | ≤ 200 fs |
| Stage XYZ travel | 100 mm×100 mm×25 mm |
| High-precision Z-axis | Travel ≥75 μm; minimum step size ≤ 10 nm |
| Environmental Conditions | Yellow safelight; ISO Class 7(10,000) or better cleanroom; vibration isolation exceeding VC-C; Laboratory ambient tem- perature recommended at 21-23°C |
| Compressed Air | Not necessary, only for active vibration isolation and vacuum stage fixtures |
Multifunctional Manual Wire Bonder SA-MMWB-450B
In stock
SKU:
SA-MMWB-450B
| Bonding Wire Type | Au(15~75μm),Pt(18~25μm),Ag(18~50μm) |
|---|---|
| Cavity Depth | 12mm(max.) |
| Capillary Length | 16mm/19mm |
| Spool Diameter | 1/2inch(standard), 2inches(optional) |
| Bonding Force | 1~250g |
| Bond Power | Numerical control,1000x subdivision |
| Clamping Table | Maximum Temperature 200℃ |
| Bond Head Z Range | 18mm |
| Bond Head X-Y Range | X=15mm,Y=15mm |
| Lifting Table Z Range | 0~18mm |
| Weight | 47kg(GW.), 70kg(NW.) |
| Input Voltage | 220V±10%@50~60Hz |
| Power Consumption | ≤500W |
| Size(L×W×H)or(D×W×H) | 640mm×620mm×450mm |
Hot
Multifunctional Manual Wire Bonder SA-MMWB-450PB
In stock
SKU:
SA-MMWB-450PB
| Bonding Wire Type | Au(15~75μm),Pt(18~25μm), Cu(18~50μm),Ag(18~50μm) |
|---|---|
| Cavity Depth | 15mm(max.) |
| Capillary Length | 16mm/19mm |
| Spool Diameter | 1/2inch(standard), 2inches(optional) |
| Bonding Force | 1~250g |
| Bond Power | Numerical control,1000x subdivision |
| Clamping Table | Maximum Temperature 200℃ |
| Bond Head Z Range | 18mm |
| Bond Head X-Y Range | X=15mm,Y=15mm |
| Lifting Table Z Range | 0~18mm |
| Weight | 47kg(GW.), 70kg(NW.) |
| Input Voltage | 220V±10%@50~60Hz |
| Power Consumption | ≤500W |
| Size(L×W×H)or(D×W×H) | 640mm×620mm×450mm |
Multifunctional Manual Wire Bonder SA-MMWB-450PW
In stock
SKU:
SA-MMWB-450PW
| Bonding Wire Type | Al(18~100μm),Au(15~75μm), Gold Ribbon(12.7 × 50μm~25.4 × 300μm),specific alloy wire |
|---|---|
| Cavity Depth | 21mm(max.) |
| Capillary Length | 19mm/25mm |
| Spool Diameter | 1/2inch(standard), 2inches(optional) |
| Bonding Force | 1~250g |
| Bond Power | Numerical control,1000x subdivision |
| Clamping Table | Maximum Temperature 200℃ |
| Bond Head Z Range | 18mm |
| Bond Head X-Y Range | X=15mm,Y=15mm |
| Lifting Table Z Range | 0~18mm |
| Weight | 47kg(GW.), 70kg(NW.) |
| Input Voltage | 220V±10%@50~60Hz |
| Power Consumption | ≤500W |
| Size(L×W×H)or(D×W×H) | 640mm×620mm×450mm |
Poly-Si Etcher SA-NMC508SES
In stock
SKU:
SA-NMC508SES
| Wafer Size | 6″, 8″ |
|---|---|
| Etching Materials | PolySi, Si |
| Processes | Poly EB/STI/Poly gate/CT Si |
| Coil | Dual Zone |
| Match Mode | L-Match |
| Magnetic Shield | Yes |
| Gas Injector | Dual Zone |
| FRC | Yes |
| Liner | Symmetric Grid |
| Edge Ring | CIP version |
| ESC | Dual Zone |
| ESC Materials | Ceramic |
| Lift Pin | Ceramic |
| Turbo | 1600L/s |
| Chamber | Symmetric |
| Size(L×W×H)or(D×W×H) | 3279mm×3253mm×2339mm |
Reactive Magnetron Sputter System SA-VKV500
In stock
SKU:
SA-VKV500
| Number of Cathodes(max.) | 2 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Ion Source | RF & Kaufman & Hall ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Single-wafer/multi-wafer fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | ±2% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø200 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + Capacitance diaphragm gauge |
| Temperature Range | -50~800℃ |
| Size(L×W×H)or(D×W×H) | 3.8m×2.8m×2.2m |
Resistance Evaporation System SA-VKT360
In stock
SKU:
SA-VKT360
| Power Supply(max.) | 8kW |
|---|---|
| Automatic Loadlocks | Single &multi-chip automatic laodlock |
| Workpiece Angle | -45°~45°，adjustable |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Hall ion source |
| Fixture types | Dome & Knudsen & Plate |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | ±3% |
| Coating Repeatability | ±2% |
| Uniform Deposition Area(max.) | Ø200 mm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | -50~500℃ |
| Size(L×W×H)or(D×W×H) | 3.15m×2.4m×2.2m |