Showing 25–36 of 48 results
Fully Automatic Photonics Wafer Test System SA-WIT-220AL
In stock
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SKU:
SA-WIT-220AL
| Wafer Size | 2″~12″ |
|---|---|
| Loading Method | Automatic |
| Loading Type | Cassette/FOUP |
| Testing Capacity | 25~50 pcs/run |
| Wafer-ID | OCR-based automatic Wafer-ID recognition with Wafer Map generation |
| Auxiliary Chuck | Enables automatic probe cleaning, RF calibration, FA calibration, PD power/polarization calibration |
| Single-Probe Marking | Yes |
| Self-Cleaning | Yes (for wafer, Chuck, probes, FA) |
| Real-Time Height Sensing | Yes |
| Chuck Height Calibration | Yes |
| Chuck Positioning Accuracy | Ā±2Āµm |
| Temperature Range | -40~125ā |
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Indium Evaporation System SA-VKT550I
In stock
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SKU:
SA-VKT550I
| Power Supply(max.) | 8kW |
|---|---|
| Workpiece Angle | -45Ā°~45Ā°ļ¼adjustable |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Kaufman & Hall ion source |
| Fixture types | Dome & Knudsen & Plate |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | Ā±3% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć300āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | -80~200ā |
| Size(LĆWĆH) | 3.3mĆ2.7mĆ2.2m |
Magnetron Sputter System SA-VKM360
In stock
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SKU:
SA-VKM360
| Number of Cathodes(max.) | 4 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Ion Source | RF & Kaufman & Hall ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | Ā±3% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć150āÆmm |
| Vacuum Measurement | Full-range vacuum gauge + āCapacitance diaphragm gauge |
| Ultimate Vacuum | 1E-5Pa |
| Temperature Range | RT~300ā |
| Size(LĆWĆH) | 1.6mĆ2.75mĆ1.8m |
Magnetron Sputter System SA-VKM600/M700
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SKU:
SA-VKM600/M700
| Number of Cathodes(max.) | 5 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Single-wafer / multi-wafer fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | Ā±2% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć300āÆmm |
| Ultimate Vacuum | 8E-6Pa |
| Vacuum Measurement | Full-range vacuum gauge + āCapacitance diaphragm gauge |
| Temperature Range | -50~800ā |
| Size(LĆWĆH) | 3.2mĆ3.3mĆ2.2m |
Magnetron Sputter System SA-VKM800
In stock
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SKU:
SA-VKM800
| Number of Cathodes(max.) | 4 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Ion Source | RF & Kaufman & Hall ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Multi-wafer fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | Ā±1.5% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | 5ĆĆ300āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + āCapacitance diaphragm gauge |
| Temperature Range | -50~800ā |
| Size(LĆWĆH) | 3.2mĆ3.3mĆ2.2m |