Showing 25–36 of 48 results
Fully Automatic Photonics Wafer Test System SA-WIT-220AL
SKU:
SA-WIT-220AL
In stock
Call for Price| Wafer Size | 2″~12″ |
|---|---|
| Loading Method | Automatic |
| Loading Type | Cassette/FOUP |
| Testing Capacity | 25~50 pcs/run |
| Wafer-ID | OCR-based automatic Wafer-ID recognition with Wafer Map generation |
| Auxiliary Chuck | Enables automatic probe cleaning, RF calibration, FA calibration, PD power/polarization calibration |
| Single-Probe Marking | Yes |
| Self-Cleaning | Yes (for wafer, Chuck, probes, FA) |
| Real-Time Height Sensing | Yes |
| Chuck Height Calibration | Yes |
| Chuck Positioning Accuracy | Ā±2Āµm |
| Temperature Range | -40~125ā |
Fully automatic RCA cleaning manchine SA-RCA-48LS
SKU:
SA-RCA-48LS
In stock
Call for Price| Wafer Size | 4″, 5″, 6″, 8″, 12″ |
|---|---|
| Cleaning Capacity | 4″~8″:25pieces2baskets/batch, 12″:25pieces/batch |
| Control Part | PLC and HMI |
Fully automatic single wafer cleaner SA-SWC-48LS
SKU:
SA-SWC-48LS
In stock
Call for Price| Wafer Size | 4″&6″, 6″&8″, 8″&12″ |
|---|
Fully automatic slot developing manchine SA-SDM-48LS
SKU:
SA-SDM-48LS
In stock
Call for Price| Wafer Size | 4″~6″ |
|---|---|
| Cleaning Capacity | 25pieces2baskets or 4baskets/batch |
Hot
Fully automatic wafer etching manchine SA-WEM-48LS
SKU:
SA-WEM-48LS
In stock
Call for Price| Wafer Size | 4″~12″ |
|---|---|
| Ness Increment | Ī“TTVā¤1.5Ī¼m |
| Cleaning Capacity | 6″:75pieces/time, 8″/12″:50pieces/time |
General PVD System SA-eVictor AX20P
SKU:
SA-eVictor AX20P
In stock
Call for Price| Wafer Size | 6″, 8″ |
|---|---|
| THK mean(A) | 1000Ā±50(Ni), 600Ā±30(Ti), 1000Ā±50(TiN), 40KĀ±2K(Al) |
| Rs Mean(Ī©/ā”) | 1Ā±0.02(Ni), 11Ā±1.0(Ti), 16Ā±3.0(TiN), 0.75Ā±0.05(Al) |
| Rs U%(WIW,%,16) | < 3% |
| Infilm Particle | < 30ea@0.3Ī¼m |
| Size(LĆWĆH) | 2700mmĆ3200mmĆ2200mm, 4400mmĆ3100mmĆ2200mm |
General PVD System SA-Polaris BM620
SKU:
SA-Polaris BM620
In stock
Call for Price| Wafer Size | 6″, 8″ |
|---|---|
| THK mean(A) | 1500Ā±75(Ni), 2000Ā±100(Ti), 10KĀ±500(Ag) |
| Rs Mean(Ī©/ā”) | 0.6Ā±0.1(Ni), 2.9Ā±0.3(Ti), 0.021Ā±0.005(Ag) |
| Rs U%(WIW,%,16) | < 3@EE3 |
| Infilm Particle | < 30ea@0.3Ī¼m |
| Size(LĆWĆH) | 2700mmĆ3200mmĆ2200mm, 4400mmĆ3100mmĆ2200mm |
Indium Evaporation System SA-VKT550I
SKU:
SA-VKT550I
In stock
Call for Price| Power Supply(max.) | 8kW |
|---|---|
| Workpiece Angle | -45Ā°~45Ā°ļ¼adjustable |
| Film thickness monitoring | Crystal oscillator controller |
| Ion Source | Kaufman & Hall ion source |
| Fixture types | Dome & Knudsen & Plate |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Coating Uniformity | Ā±3% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć300āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge |
| Temperature Range | -80~200ā |
| Size(LĆWĆH) | 3.3mĆ2.7mĆ2.2m |
Magnetron Sputter System SA-VKM360
SKU:
SA-VKM360
In stock
Call for Price| Number of Cathodes(max.) | 4 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Ion Source | RF & Kaufman & Hall ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | Ā±3% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć150āÆmm |
| Vacuum Measurement | Full-range vacuum gauge + āCapacitance diaphragm gauge |
| Ultimate Vacuum | 1E-5Pa |
| Temperature Range | RT~300ā |
| Size(LĆWĆH) | 1.6mĆ2.75mĆ1.8m |
Magnetron Sputter System SA-VKM600/M700
SKU:
SA-VKM600/M700
In stock
Call for Price| Number of Cathodes(max.) | 5 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Single-wafer / multi-wafer fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | Ā±2% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | Ć300āÆmm |
| Ultimate Vacuum | 8E-6Pa |
| Vacuum Measurement | Full-range vacuum gauge + āCapacitance diaphragm gauge |
| Temperature Range | -50~800ā |
| Size(LĆWĆH) | 3.2mĆ3.3mĆ2.2m |
Magnetron Sputter System SA-VKM800
SKU:
SA-VKM800
In stock
Call for Price| Number of Cathodes(max.) | 4 |
|---|---|
| Sputtering Power Supply | DC / RF / pulsed DC, freely switchable |
| Ion Source | RF & Kaufman & Hall ion source |
| Bias | RF / pulsed DC |
| Vacuum Sampling Chamber | Multi-wafer fully-automatic sampling chamber, optional |
| Pumping System | Cryopump / magnetically levitated turbo-molecular pump + Dry mechanical pump |
| Flow Control | Digital mass flow meter |
| Coating Uniformity | Ā±1.5% |
| Coating Repeatability | Ā±2% |
| Uniform Deposition Area(max.) | 5ĆĆ300āÆmm |
| Ultimate Vacuum | 1E-5Pa |
| Vacuum Measurement | Full-range vacuum gauge + āCapacitance diaphragm gauge |
| Temperature Range | -50~800ā |
| Size(LĆWĆH) | 3.2mĆ3.3mĆ2.2m |